⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10700567 | 0.75 | — | — | |
| SCHEMBL7259666 | 0.72 | — | — | |
| SCHEMBL718700 | 0.64 | — | — | |
| SCHEMBL4842857 | 0.57 | — | — | |
| SCHEMBL7743047 | 0.57 | — | — | |
| SCHEMBL10798475 | 0.57 | — | — | |
| SCHEMBL2194932 | 0.56 | — | — | |
| SCHEMBL72016 | 0.54 | — | — | |
| SCHEMBL8777519 | 0.50 | — | — | |
| SCHEMBL27765889 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4667616-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Hansol Chemical Co., Ltd (KR) | 2025-12-24 | — | — | EP | claimed |
| US-20250369114-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | HANSOL CHEMICAL CO LTD (KR) | 2025-12-04 | — | — | US | claimed |
| WO-2018149830-A1 | METHOD FOR FORMING Si-CONTAINING FILM | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2018-08-23 | — | — | WO | claimed |
| EP-2030227-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM America, Inc. (US) | 2009-03-04 | — | — | EP | claimed |
| US-20080026149-A1 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2008-01-31 | — | — | US | claimed |
| WO-2007140375-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2007-12-06 | — | — | WO | claimed |
| US-20260070792-A1 | METHOD FOR PRODUCING HALOTRISILANE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-03-12 | — | — | US | disclosed |
| EP-4667616-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Hansol Chemical Co., Ltd (KR) | 2025-12-24 | — | — | EP | disclosed |
| US-20250369114-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | HANSOL CHEMICAL CO LTD (KR) | 2025-12-04 | — | — | US | disclosed |
| US-20250059644-A1 | SEMICONDUCTOR PROCESSING SYSTEM, A SEMICONDUCTOR PRECURSOR STORAGE VESSEL AND A METHOD OF FORMING A SILICON COMPRISING LAYER | ASM IP HOLDING B.V. (NL) | 2025-02-20 | — | — | US | disclosed |
| US-20240379347-A1 | SELECTIVE DEPOSITION OF A MATERIAL COMPRISING SILICON AND NITROGEN | ASM IP HOLDING B.V. (NL) | 2024-11-14 | — | — | US | disclosed |
| WO-2018149830-A1 | METHOD FOR FORMING Si-CONTAINING FILM | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2018-08-23 | — | — | WO | disclosed |
| US-20150080596-A1 | Method Of Reducing A Halosilane Compound In A Micoreactor | DOW CORNING CORPORATION | 2015-03-19 | — | — | US | disclosed |
| US-8207039-B2 | Method of manufacturing semiconductor device | FUJITSU SEMICONDUCTOR LIMITED (JP) | 2012-06-26 | — | — | US | disclosed |
| US-7994538-B2 | Semiconductor device and method of manufacturing the same | FUJITSU SEMICONDUCTOR LIMITED (JP) | 2011-08-09 | — | — | US | disclosed |
| US-20100297821-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU SEMICONDUCTOR LIMITED (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20090095982-A1 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU MICROELECTRONICS LIMITED (JP) | 2009-04-16 | — | — | US | disclosed |
| EP-2030227-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM America, Inc. (US) | 2009-03-04 | — | — | EP | disclosed |
| US-20080026149-A1 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2008-01-31 | — | — | US | disclosed |
| WO-2007140375-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2007-12-06 | — | — | WO | disclosed |