⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10700567 | 0.89 | — | — | |
| SCHEMBL2286159 | 0.72 | — | — | |
| SCHEMBL935442 | 0.71 | ALDH1A1 (0.30) | — | |
| SCHEMBL11657157 | 0.66 | — | — | |
| SCHEMBL11868439 | 0.66 | — | — | |
| SCHEMBL4538711 | 0.66 | — | — | |
| SCHEMBL2194932 | 0.64 | — | — | |
| SCHEMBL1673235 | 0.61 | ALDH1A1 (0.30) | — | |
| SCHEMBL718700 | 0.57 | — | — | |
| SCHEMBL8423556 | 0.54 | ALDH1A1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3170792-B1 | METHOD FOR PRODUCING CYCLIC SILANE USING CONCENTRATION METHOD AND METHOD FOR PRODUCING POLYSILANE | THIN FILM ELECTRONICS ASA (NO) | 2020-09-09 | — | — | EP | disclosed |
| US-10202283-B2 | Method for producing cyclic silane using concentration method | THIN FILM ELECTRONICS ASA (NO) | 2019-02-12 | — | — | US | disclosed |
| US-20170203970-A1 | Method for Producing Cyclic Silane Using Concentration Method | ENSURGE MICROPOWER ASA | 2017-07-20 | — | — | US | disclosed |
| EP-3170792-A1 | METHOD FOR PRODUCING CYCLIC SILANE USING CONCENTRATION METHOD | Thin Film Electronics ASA (NO) | 2017-05-24 | — | — | EP | disclosed |
| US-6517911-B1 | Process for the formation of silicon oxide films | JSR CORPORATION (JP) | 2003-02-11 | — | — | US | disclosed |
| EP-1087433-A1 | PROCESS FOR THE FORMATION OF SILICON OXIDE FILMS | JSR Corporation (JP) | 2001-03-28 | — | — | EP | disclosed |