SCHEMBL22862175

SCHEMBL22862175

O=C1C=CC(=O)N1c1ccc2cc(C(c3ccc(-c4ccccc4)cc3)c3ccc4cc(N5C(=O)C=CC5=O)ccc4c3)ccc2c1

nearest known ligand 0.59

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HSP90AA1 P07900 5/20 0.59
MGLL Q99685 15/20 0.58
FAAH O00519 7/20 0.58
ALDH1A1 P00352 2/20 0.54
PKM P14618 2/20 0.54
HTT P42858 2/20 0.54
ATM Q13315 2/20 0.54
PDE6D O43924 1/20 0.37
MEN1 O00255 1/20 0.36
LMNA P02545 1/20 0.36
HPGD P15428 1/20 0.36
CCR6 P51684 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22862083 0.94 HSP90AA1 (0.57) HSP90AA1MGLLFAAHALDH1A1PKM
SCHEMBL22862183 0.86 HSP90AA1 (0.45) HSP90AA1MGLLFAAHALDH1A1PKM
SCHEMBL22862127 0.86 MGLL (0.79) HSP90AA1MGLLFAAHALDH1A1PKM
SCHEMBL22862078 0.79 MGLL (0.64) HSP90AA1MGLLFAAHALDH1A1PKM
SCHEMBL2597100 0.78 MGLL (0.65) HSP90AA1MGLLFAAHALDH1A1PKM
SCHEMBL29510752 0.76 HSP90AA1 (1.00) HSP90AA1MGLLFAAHALDH1A1PKM
SCHEMBL2146237 0.76 HSP90AA1 (1.00) HSP90AA1MGLLFAAHALDH1A1PKM
SCHEMBL9719419 0.76 MGLL (1.00) HSP90AA1MGLLFAAHALDH1A1PKM
SCHEMBL21993642 0.76 MGLL (1.00) HSP90AA1MGLLFAAHALDH1A1PKM
SCHEMBL19512050 0.76 HSP90AA1 (0.83) HSP90AA1MGLLFAAHPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210003921-A1 COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGRAPHY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-07 US disclosed
EP-3760611-A1 COMPOUND, RESIN, COMPOSITION AND FILM-FORMING MATERIAL FOR LITHOGRAPHY USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210003921-A1 COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGRAPHY USING THE SAME COL1A1, MLLT3, F12 HSP90AA1 2396/4885MGLL 1551/4885FAAH 2256/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.