⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Urea SCHEMBL10348576 | 0.90 | — | — | |
| Bicarbonate SCHEMBL6685002 | 0.86 | — | — | |
| Acetic Acid SCHEMBL28584351 | 0.83 | — | — | |
| Acetic Acid SCHEMBL11218327 | 0.83 | — | — | |
| Acetone SCHEMBL11226617 | 0.79 | — | — | |
| Glyoxylate SCHEMBL3379774 | 0.78 | — | — | |
| SCHEMBL114712 | 0.78 | — | — | |
| SCHEMBL202602 | 0.78 | — | — | |
| SCHEMBL93710 | 0.78 | — | — | |
| Carbamic Acid SCHEMBL27691887 | 0.75 | ACHE (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11905361-B2 | Base proliferating agent, and base-reactive resin composition containing said base proliferating agent | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-02-20 | — | — | US | disclosed |
| US-20200407487-A1 | Base Proliferating Agent, and Base-Reactive Resin Composition Containing Said Base Proliferating Agent | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2020-12-31 | — | — | US | disclosed |
| WO-2019163981-A1 | BASE PROLIFERATING AGENT, AND BASE-REACTIVE RESIN COMPOSITION CONTAINING SAID BASE PROLIFERATING AGENT | 日本化薬株式会社 | 2019-08-29 | — | — | WO | disclosed |
| US-8969577-B2 | Curable composition comprising a thermolatent base | BASF SE (DE) | 2015-03-03 | — | — | US | disclosed |
| EP-2199856-B1 | Cationic radiation curable compositions | AGFA GRAPHICS NV (BE) | 2013-08-07 | — | — | EP | disclosed |
| EP-2367794-B1 | CURABLE COMPOSITION COMPRISING A THERMOLATENT BASE | BASF SE (DE) | 2013-01-09 | — | — | EP | disclosed |
| CN-102257432-A | Cationic radiation curable compositions | AGFA GRAPHICS NV | 2011-11-23 | — | — | CN | disclosed |
| CN-102224140-A | Curable composition comprising a thermolatent base | BASF SE | 2011-10-19 | — | — | CN | disclosed |
| US-20110245375-A1 | CURABLE COMPOSITION COMPRISING A THERMOLATENT BASE | BASF SE (DE) | 2011-10-06 | — | — | US | disclosed |
| EP-2367794-A1 | CURABLE COMPOSITION COMPRISING A THERMOLATENT BASE | BASF SE (DE) | 2011-09-28 | — | — | EP | disclosed |
| US-4610957-A | SILVER HALIDE EMULSIONS, ACID AND BASE PRECUSORS | FUJI PHOTO FILM CO., LTD. (JP) | 1986-09-09 | — | — | US | disclosed |
| US-4603103-A | THERMALLY DECOMPOSABLE ORGANIC SILVER SALT ON A SUPPORT | FUJI PHOTO FILM CO., LTD. (JP) | 1986-07-29 | — | — | US | disclosed |
| US-4595652-A | Contains dye-providing material | FUJI PHOTO FILM CO., LTD. (JP) | 1986-06-17 | — | — | US | disclosed |
| US-4590152-A | STORAGE STABILITY, HIGH IMAGE DESITY | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-20 | — | — | US | disclosed |
| US-4590154-A | ANTIFOGGING AGENTS | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-20 | — | — | US | disclosed |
| EP-0180224-A2 | Dye transfer method | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-07 | — | — | EP | disclosed |
| EP-0174634-A2 | Image forming method | FUJI PHOTO FILM CO., LTD. (JP) | 1986-03-19 | — | — | EP | disclosed |
| EP-0160313-A2 | Heat developable color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1985-11-06 | — | — | EP | disclosed |
| EP-0143424-A2 | Heat-developable light-sensitive materials | FUJI PHOTO FILM CO., LTD. (JP) | 1985-06-05 | — | — | EP | disclosed |
| US-4353915-A | ARTHROPODICIDES, NEMATOCIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1982-10-12 | — | — | US | disclosed |