SCHEMBL22882568

SCHEMBL22882568

C=C(C)C(=O)Oc1cc(C(F)(F)F)c(O)c(C(F)(F)F)c1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 1/20 0.41
▸ KMT2A Q03164 2/20 0.38
▸ ATM Q13315 1/20 0.38
▸ CA1 P00915 1/20 0.34
▸ CA2 P00918 1/20 0.34
▸ ALDH1A1 P00352 2/20 0.32
▸ VCAM1 P19320 3/20 0.32
▸ GAA P10253 1/20 0.31
▸ TDP1 Q9NUW8 1/20 0.31
▸ EPHX2 P34913 1/20 0.31
▸ KIF11 P52732 1/20 0.30
▸ NOTUM Q6P988 1/20 0.30
▸ MAOA P21397 1/20 0.30
▸ MAOB P27338 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3193007 0.85 CA2 (0.52) ELANEKMT2AATMCA1CA2
SCHEMBL26793677 0.83 ELANE (0.44) ELANEKMT2AATMALDH1A1GAA
SCHEMBL15836530 0.82 ELANE (0.46) ELANEKMT2AATMTDP1EPHX2
SCHEMBL11795166 0.80 ELANE (0.38) ELANEKMT2AATMCA1CA2
SCHEMBL17352134 0.80 ELANE (0.44) ELANEKMT2AATMKIF11
SCHEMBL5004362 0.79 ELANE (0.42) ELANEKMT2AATMALDH1A1KIF11
SCHEMBL11800906 0.78 ELANE (0.37) ELANEKMT2AATMCA1CA2
SCHEMBL15357797 0.78 ELANE (0.53) ELANEKMT2AATMALDH1A1TDP1
SCHEMBL18309865 0.77 ELANE (0.44) ELANEKMT2AATMALDH1A1
SCHEMBL11807419 0.77 ELANE (0.36) ELANEKMT2AATMCA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11573491-B2 Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-02-07 — — US disclosed
EP-3779596-A1 NEGATIVE-TYPE PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2021-02-17 — — EP disclosed
US-20210011380-A1 NEGATIVE TONE PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-01-14 — — US disclosed
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