⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2112947 | 0.96 | — | — | |
| SCHEMBL17160911 | 0.86 | PLA2G2C (0.31) | — | |
| SCHEMBL4920943 | 0.81 | ALOX15 (0.33) | — | |
| SCHEMBL8937868 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL148737 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL16105656 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL2115699 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL2289781 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL2114481 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL6916438 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12036808-B2 | Ink jet recording method using temporary curing radiation | SEIKO EPSON CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| EP-3460013-B1 | INK JET COMPOSITION SET AND INK JET RECORDING METHOD | SEIKO EPSON CORP (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-10590297-B2 | Ink jet composition set and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2020-03-17 | — | — | US | disclosed |
| EP-3470477-A1 | RADIATION-CURABLE INK JET INK COMPOSITION AND INK JET RECORDING METHOD | Seiko Epson Corporation (JP) | 2019-04-17 | — | — | EP | disclosed |
| US-20190092957-A1 | INK JET COMPOSITION SET AND INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| EP-3460013-A1 | INK JET COMPOSITION SET AND INK JET RECORDING METHOD | Seiko Epson Corporation (JP) | 2019-03-27 | — | — | EP | disclosed |
| US-9873808-B2 | Ultraviolet-curable ink jet ink composition | SEIKO EPSON CORPORATION (JP) | 2018-01-23 | — | — | US | disclosed |
| US-9827760-B2 | Ink jet recording method and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2017-11-28 | — | — | US | disclosed |
| US-9796193-B2 | Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2017-10-24 | — | — | US | disclosed |
| US-9782982-B2 | Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2017-10-10 | — | — | US | disclosed |
| US-20130286121-A1 | INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2013-10-31 | — | — | US | disclosed |
| US-8564142-B2 | Radiation curable ink jet ink composition and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2013-10-22 | — | — | US | disclosed |
| US-20130258015-A1 | ULTRAVIOLET RAY-CURABLE CLEAR INK COMPOSITION AND RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130141504-A1 | LIGHT-CURABLE INK COMPOSITION FOR INK JET RECORDING AND INK JET RECORDING METHOD USING THE SAME | SEIKO EPSON CORPORATION (JP) | 2013-06-06 | — | — | US | disclosed |
| US-8236872-B2 | Adhesive composition and optical member | CHEIL INDUSTRIES, INC. (KR) | 2012-08-07 | — | — | US | disclosed |
| US-20120147095-A1 | INK COMPOSITION FOR ULTRAVIOLET CURABLE INK JETS, INK JET RECORDING APPARATUS USING THE SAME, INK JET RECORDING METHOD USING THE SAME, AND INK SET | SEIKO EPSON CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120133059-A1 | RADIATION CURABLE INK JET COMPOSITION, RECORDED MATTER, AND INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20110195249-A1 | ADHESIVE COMPOSITION AND OPTICAL MEMBER | Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) | 2011-08-11 | — | — | US | disclosed |
| US-7763686-B2 | Having a narrow molecular weight distribution in a short amount of time and with good productivity by mixing a first Lewis acid with a proton source to generate initiator cations, and adding a vinyl ether and a second Lewis acid to initiate a high-speed polymerization | CANON KABUSHIKI KAISHA (JP) | 2010-07-27 | — | — | US | disclosed |
| US-20060194935-A1 | Process for producing polyalkenyl ether | CANON KABUSHIKI KAISHA (JP) | 2006-08-31 | — | — | US | disclosed |