Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 1/20 | 0.35 |
| ▸ | NQO1 | P15559 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | NCEH1 | Q6PIU2 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL69340 | 0.78 | CYP2A6 (0.41) | CYP2A6NQO1ALDH1A1HIF1ACYP1B1 | |
| SCHEMBL9559831 | 0.76 | CYP1A2 (0.40) | NQO1ALDH1A1KDM4EGAA | |
| SCHEMBL2255827 | 0.76 | ALDH1A1 (0.40) | NQO1ALDH1A1HIF1ACYP1B1HSD17B10 | |
| SCHEMBL1557069 | 0.74 | CYP1A2 (0.39) | CYP2A6NQO1ALDH1A1HIF1ACYP1B1 | |
| SCHEMBL629844 | 0.74 | CYP1A2 (0.31) | — | |
| SCHEMBL6152174 | 0.74 | CYP1A2 (0.31) | — | |
| SCHEMBL25231782 | 0.73 | SLC9A1 (0.33) | ALDH1A1HIF1ACYP1B1HSD17B10 | |
| SCHEMBL1168423 | 0.73 | MEN1 (0.38) | ALDH1A1HIF1AHSD17B10KDM4E | |
| SCHEMBL30805630 | 0.73 | CYP2A6 (0.48) | CYP2A6NQO1ALDH1A1HIF1ACYP1B1 | |
| SCHEMBL1957000 | 0.73 | CYP2A6 (0.48) | CYP2A6NQO1ALDH1A1HIF1ACYP1B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8709701-B2 | Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-04-29 | — | — | US | disclosed |
| US-20110207331-A1 | Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20100022090-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, CONTAINING AROMATIC FUSED RING-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |