Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 2/20 | 0.37 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.33 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7523174 | 0.94 | — | — | |
| SCHEMBL11328517 | 0.80 | MAPT (0.37) | SLC6A2SLC6A4SMN1; SMN2POLBMEN1 | |
| SCHEMBL17694210 | 0.79 | SMN1; SMN2 (0.38) | SLC6A2SLC6A4SMN1; SMN2POLBMEN1 | |
| SCHEMBL17870979 | 0.79 | ALDH1A1 (0.41) | MEN1KMT2AALDH1A1RAB9A | |
| SCHEMBL11359743 | 0.79 | SMN1; SMN2 (0.38) | SLC6A2SLC6A4SMN1; SMN2POLBMEN1 | |
| SCHEMBL4022810 | 0.79 | SMN1; SMN2 (0.38) | SLC6A2SLC6A4SMN1; SMN2POLBMEN1 | |
| SCHEMBL2293450 | 0.79 | ALDH1A1 (0.41) | MEN1KMT2AALDH1A1RAB9A | |
| SCHEMBL11359740 | 0.79 | SMN1; SMN2 (0.38) | SLC6A2SLC6A4SMN1; SMN2POLBMEN1 | |
| SCHEMBL4022813 | 0.79 | SMN1; SMN2 (0.38) | SLC6A2SLC6A4SMN1; SMN2POLBMEN1 | |
| SCHEMBL4931699 | 0.78 | FABP7 (0.45) | SMN1; SMN2CHRM2CHRM4CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0217243-A2 | Tertiary-butyldimethylsilyl carbamate derivative and process for producing the same | SUNTORY LIMITED (JP) | 1987-04-08 | — | — | EP | claimed |
| CN-112424188-A | Pyridazinones as PARP7 inhibitors | 里邦医疗公司 | 2021-02-26 | — | — | CN | disclosed |
| US-8795942-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| CN-101945936-B | Ionomeric polyester copolymer/organoclay nanocomposites, method of manufacture, and articles formed therefrom | SABIC INNOVATIVE PLASTICS IP | 2014-01-22 | — | — | CN | disclosed |
| CN-101945933-B | Telechelic polyester/polycarbonate/organoclay nanocomposites, and related methods and articles | SABIC INNOVATIVE PLASTICS IP | 2013-08-21 | — | — | CN | disclosed |
| CN-101874054-B | Polyester composition with improved heat resistance | SABIC INNOVATIVE PLASTICS IP | 2013-04-17 | — | — | CN | disclosed |
| CN-101124282-B | Optically clear polycarbonate polyester compositions | SABIC INNOVATIVE PLASTICS IP | 2013-01-09 | — | — | CN | disclosed |
| US-20120288796-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20120214100-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| CN-101151295-B | Polyarylate compositions and articles made therefrom | SABIC INNOVATIVE PLASTICS IP | 2012-08-15 | — | — | CN | disclosed |
| CN-101065433-A | A stabilized polycarbonate polyester composition | GEN ELECTRIC (US) | 2007-10-31 | — | — | CN | disclosed |
| CN-101061148-A | Curable formulations, cured compositions, and articles derived therefrom | GEN ELECTRIC (US) | 2007-10-24 | — | — | CN | disclosed |
| CN-101061181-A | Method for controlling haze in an article comprising a polymer composition | GEN ELECTRIC (US) | 2007-10-24 | — | — | CN | disclosed |
| US-6414160-B1 | REACTING 5-ALKOXY-2(3H)OXAZOLONE COMPOUND WITH ALDEHYDE COMPOUND IN PRESENCE OF LEWIS ACID CATALYST | UBE INDUSTRIES, LTD. (JP) | 2002-07-02 | — | — | US | disclosed |
| CN-1036064-C | Benzene derivatives having NGF production-promoting activity | SANKYO CO (JP) | 1997-10-08 | — | — | CN | disclosed |
| US-5643925-A | COGNITION ACTIVATORS AND NERVE GROWTH FACTORS | SANKYO COMPANY, LIMITED (JP) | 1997-07-01 | — | — | US | disclosed |
| US-5614521-A | NERVE GROWTH FACTOR | SANKYO COMPANY, LIMITED (JP) | 1997-03-25 | — | — | US | disclosed |
| EP-0501656-B1 | New benzene derivatives having (NGF) production-promoting activity | SANKYO CO (JP) | 1997-01-22 | — | — | EP | disclosed |
| CN-1064273-A | The new NGF that has generates the active benzene derivative of promotion | SANKYO CO (JP) | 1992-09-09 | — | — | CN | disclosed |
| EP-0501656-A2 | New benzene derivatives having (NGF) production-promoting activity | Sankyo Company Limited (JP) | 1992-09-02 | — | — | EP | disclosed |