SCHEMBL22924628

SCHEMBL22924628

COC(C)(C)OC(=O)c1ccc(CCI)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4A11 Q02928 3/20 0.45
CYP4F2 P78329 2/20 0.44
LOXL2 Q9Y4K0 1/20 0.41
MAPT P10636 2/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
ELANE P08246 1/20 0.39
CA1 P00915 3/20 0.38
CA2 P00918 3/20 0.38
ALDH1A1 P00352 2/20 0.38
TP53 P04637 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
HPGD P15428 1/20 0.38
ALOX15 P16050 1/20 0.38
ALOX12 P18054 1/20 0.38
CYP2C19 P33261 1/20 0.38
CKS1B P61024 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22924631 0.84 RARB (0.50) CYP4A11CYP4F2MAPTNPC1RAB9A
SCHEMBL22924632 0.79 SMN1; SMN2 (0.41) CYP4A11LOXL2MAPTNPC1RAB9A
SCHEMBL1426157 0.79 CYP4A11 (0.68) CYP4A11CYP4F2LOXL2MAPTNPC1
SCHEMBL6892781 0.78 CYP4A11 (0.66) CYP4A11CYP4F2LOXL2MAPTNPC1
SCHEMBL28894544 0.78 CA1 (0.48) MAPTSMN1; SMN2ELANECA1CA2
SCHEMBL8562574 0.77 CYP4A11 (0.49) CYP4A11CYP4F2LOXL2CA1CA2
SCHEMBL22924627 0.75 TSHR (0.57) MAPTRAB9AALDH1A1TP53CYP1A2
SCHEMBL7385067 0.74 CA1 (0.50) CYP4A11CYP4F2LOXL2ELANECA1
SCHEMBL22924629 0.74 TSHR (0.46) MAPTNPC1RAB9ASMN1; SMN2ALDH1A1
SCHEMBL1244233 0.73 CA1 (0.61) MAPTNPC1RAB9ASMN1; SMN2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210026246-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-28 US disclosed