SCHEMBL22924632

SCHEMBL22924632

CCOCc1ccc(C(=O)OC(C)(C)OC)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 5/20 0.41
MAPT P10636 3/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
NPC1 O15118 2/20 0.41
RAB9A P51151 1/20 0.41
CA1 P00915 3/20 0.41
CA2 P00918 3/20 0.41
CA12 O43570 1/20 0.41
ESR1 P03372 1/20 0.41
CA7 P43166 1/20 0.41
CA9 Q16790 1/20 0.41
ESR2 Q92731 1/20 0.41
CA14 Q9ULX7 1/20 0.41
LOXL2 Q9Y4K0 1/20 0.40
ALDH1A1 P00352 6/20 0.40
TDP1 Q9NUW8 1/20 0.40
KDM4E B2RXH2 1/20 0.39
GAA P10253 1/20 0.39
HPGD P15428 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22924629 0.87 TSHR (0.46) SMN1; SMN2MAPTMEN1KMT2ANPC1
SCHEMBL2412752 0.82 LOXL2 (0.59) SMN1; SMN2MAPTMEN1KMT2ANPC1
SCHEMBL22924631 0.80 RARB (0.50) MAPTMEN1KMT2ANPC1RAB9A
SCHEMBL22924628 0.79 CYP4A11 (0.45) SMN1; SMN2MAPTMEN1KMT2ANPC1
SCHEMBL14281812 0.78 CA12 (0.67) SMN1; SMN2MAPTMEN1KMT2ANPC1
SCHEMBL7315382 0.78 LOXL2 (0.54) SMN1; SMN2MAPTMEN1KMT2ANPC1
SCHEMBL24292275 0.77 ALDH1A1 (0.44) MAPTMEN1KMT2ANPC1RAB9A
SCHEMBL28894544 0.76 CA1 (0.48) SMN1; SMN2MAPTKMT2ACA1CA2
SCHEMBL3682176 0.76 ALDH1A1 (0.42) MAPTMEN1KMT2ANPC1RAB9A
SCHEMBL1749635 0.74 ALDH1A1 (0.61) SMN1; SMN2NPC1RAB9AALDH1A1RXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210026246-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-28 US disclosed