SCHEMBL22924629

SCHEMBL22924629

CCCCOCc1ccc(C(=O)OC(C)(C)OC)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.46
LMNA P02545 2/20 0.46
CYP1A2 P05177 2/20 0.46
CYP2C19 P33261 2/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
MAPK1 P28482 2/20 0.46
ESR1 P03372 2/20 0.46
CYP2D6 P10635 1/20 0.46
NR1H2 P55055 1/20 0.46
RNASEL Q05823 1/20 0.46
PLA2G4B P0C869 1/20 0.42
CYP3A4 P08684 2/20 0.41
CYP2C9 P11712 1/20 0.41
PDE4D Q08499 1/20 0.41
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
CASP1 P29466 1/20 0.40
HRH3 Q9Y5N1 1/20 0.40
MEN1 O00255 1/20 0.40
MAPT P10636 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22924632 0.87 SMN1; SMN2 (0.41) TSHRCYP1A2CYP2C19SMN1; SMN2MAPK1
SCHEMBL22924631 0.83 RARB (0.50) NPC1RAB9AMEN1MAPTKMT2A
SCHEMBL9262378 0.83 NPC1 (0.56) TSHRLMNACYP1A2CYP2C19SMN1; SMN2
SCHEMBL10865547 0.77 MGLL (0.51) TSHRLMNACYP1A2CYP2C19SMN1; SMN2
SCHEMBL14660779 0.77 MGLL (0.51) TSHRLMNACYP1A2CYP2C19SMN1; SMN2
SCHEMBL3669292 0.77 PLA2G4B (0.45) TSHRLMNACYP1A2CYP2C19SMN1; SMN2
SCHEMBL1750568 0.76 PLA2G4B (0.63) TSHRSMN1; SMN2PLA2G4BNPC1RAB9A
SCHEMBL8062502 0.75 PLA2G4B (0.48) TSHRLMNACYP1A2CYP2C19SMN1; SMN2
SCHEMBL18557974 0.75 L3MBTL1 (0.43) TSHRLMNACYP1A2CYP2C19SMN1; SMN2
SCHEMBL18557970 0.75 HRH3 (0.37) TSHRLMNACYP1A2CYP2C19SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210026246-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-28 US disclosed