SCHEMBL22995064

SCHEMBL22995064

O=C(Oc1ccc2ccccc2c1I)c1c(I)ccc(I)c1I

nearest known ligand 0.57

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ NCEH1 Q6PIU2 11/20 0.57
▸ KMT2A Q03164 2/20 0.39
▸ POLB P06746 2/20 0.39
▸ GAA P10253 2/20 0.39
▸ HSD17B10 Q99714 2/20 0.38
▸ LMNA P02545 3/20 0.38
▸ MMP2 P08253 1/20 0.36
▸ SMN1; SMN2 Q16637 3/20 0.35
▸ NPC1 O15118 2/20 0.35
▸ RAB9A P51151 2/20 0.35
▸ MAPT P10636 1/20 0.35
▸ TP53 P04637 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.35
▸ PGR P06401 1/20 0.35
▸ PTGS1 P23219 1/20 0.35
▸ MAPK1 P28482 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705800 0.89 NCEH1 (0.52) NCEH1KMT2APOLBGAAHSD17B10
SCHEMBL22945087 0.87 NCEH1 (0.55) NCEH1KMT2APOLBGAAHSD17B10
SCHEMBL21705802 0.78 IDO1 (0.42) NCEH1KMT2AGAAHSD17B10SMN1; SMN2
SCHEMBL22945089 0.78 ESR1 (0.42) NCEH1KMT2APOLBGAAHSD17B10
SCHEMBL22945092 0.78 FABP7 (0.42) KMT2APOLBGAAHSD17B10LMNA
SCHEMBL29946533 0.76 NCEH1 (0.69) NCEH1GAAHSD17B10LMNASMN1; SMN2
SCHEMBL21500898 0.75 KMT2A (0.46) KMT2APOLBGAAHSD17B10LMNA
SCHEMBL21705807 0.74 SMN1; SMN2 (0.46) KMT2APOLBHSD17B10LMNASMN1; SMN2
SCHEMBL21500828 0.73 ESR1 (0.57) KMT2APOLBGAAHSD17B10SMN1; SMN2
SCHEMBL21500829 0.73 GAA (0.33) NCEH1KMT2APOLBGAAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11480875-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-10-25 — — US disclosed
US-20210048748-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-18 — — US disclosed
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