SCHEMBL22978747

SCHEMBL22978747

O=C(Oc1ccccc1)c1c2ccccc2cc2ccccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.60
ALDH1A1 P00352 5/20 0.60
MEN1 O00255 4/20 0.60
KMT2A Q03164 4/20 0.60
HPGD P15428 4/20 0.60
HSD17B10 Q99714 2/20 0.60
GLA P06280 2/20 0.60
CYP1A2 P05177 1/20 0.60
CYP2C19 P33261 1/20 0.60
MAPT P10636 6/20 0.51
TDP1 Q9NUW8 3/20 0.51
NSD2 O96028 1/20 0.47
NPSR1 Q6W5P4 2/20 0.46
NR4A2 P43354 1/20 0.46
ALOX15 P16050 1/20 0.46
L3MBTL1 Q9Y468 3/20 0.44
PTK2B Q14289 1/20 0.43
LMNA P02545 2/20 0.42
TP53 P04637 1/20 0.42
CYP3A4 P08684 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8073630 0.89 MEN1 (0.56) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL16131324 0.86 ALDH1A1 (0.49) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL15967018 0.84 ALDH1A1 (0.46) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL3682069 0.82 MAPT (0.53) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL27626916 0.82 NSD2 (0.53) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL5705535 0.81 MAPT (0.50) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL7205104 0.81 MAPT (0.56) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL2535220 0.81 ABCG2 (0.51) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL31240530 0.80 ALDH1A1 (0.63) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL6940992 0.80 ALDH1A1 (0.63) KDM4EALDH1A1MEN1KMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4010441-B1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2023-09-06 EP disclosed
US-11512171-B2 Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same MERCK PATENT GMBH (DE) 2022-11-29 US disclosed
US-20220267532-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2022-08-25 US disclosed
EP-4010441-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME Merck Patent GmbH (DE) 2022-06-15 EP disclosed
CN-114207043-A Composition for producing low dielectric constant siliceous film and method for producing cured film and electronic device using the same 默克专利有限公司 2022-03-18 CN disclosed
WO-2021028297-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2021-02-18 WO disclosed