SCHEMBL22986743

SCHEMBL22986743

O=C(CI)OCCOC(=O)C1CCC(C(=O)O)CC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 2/20 0.38
PTPN1 P18031 2/20 0.38
PPP1CC P36873 2/20 0.38
LMNA P02545 2/20 0.37
PLG P00747 1/20 0.37
PLAT P00750 1/20 0.37
GABRP O00591 1/20 0.32
GABRD O14764 1/20 0.32
GABRA1 P14867 1/20 0.32
TSHR P16473 1/20 0.32
GABRB1 P18505 1/20 0.32
GABRG2 P18507 1/20 0.32
GABRB3 P28472 1/20 0.32
GABRA5 P31644 1/20 0.32
GABRA3 P34903 1/20 0.32
GABRA2 P47869 1/20 0.32
GABRB2 P47870 1/20 0.32
GABRA4 P48169 1/20 0.32
GABRE P78334 1/20 0.32
PMP22 Q01453 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8548602 0.87 LMNA (0.46) PPM1BPTPN1PPP1CCLMNAPLG
SCHEMBL16368839 0.81 LMNA (0.42) PPM1BPTPN1PPP1CCLMNAPLG
SCHEMBL17085312 0.81 LMNA (0.42) PPM1BPTPN1PPP1CCLMNAPLG
SCHEMBL18757023 0.79 PPM1B (0.46) PPM1BPTPN1PPP1CCLMNAPLG
SCHEMBL207843 0.78 MAPT (0.39) PPM1BPTPN1PPP1CCLMNAALDH1A1
SCHEMBL1297690 0.77 LMNA (0.42) PPM1BPTPN1PPP1CCLMNAPLG
SCHEMBL22986745 0.76 PPM1B (0.36) PPM1BPTPN1PPP1CCLMNAPLG
SCHEMBL1297461 0.76 PPM1B (0.57) PPM1BPTPN1PPP1CCLMNAPLG
SCHEMBL1295731 0.75 MEN1 (0.39) PPM1BPTPN1PPP1CCLMNAPLG
SCHEMBL22986748 0.75 PPM1B (0.36) PPM1BPTPN1PPP1CCLMNAPLG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-20210063879-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-03-04 US disclosed
US-20210048746-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-18 US disclosed