SCHEMBL22991500

SCHEMBL22991500

C=Cc1cc(OC(C)=O)c(I)cc1I

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTGS1 P23219 2/20 0.38
▸ TNFSF11 O14788 1/20 0.36
▸ KDM4E B2RXH2 3/20 0.35
▸ TSHR P16473 3/20 0.35
▸ ALDH1A1 P00352 2/20 0.35
▸ GAA P10253 1/20 0.35
▸ RAB9A P51151 1/20 0.35
▸ CFD P00746 2/20 0.34
▸ NR3C1 P04150 1/20 0.33
▸ SNCA P37840 1/20 0.33
▸ ALOX5 P09917 1/20 0.33
▸ TOP1 P11387 2/20 0.33
▸ JUN P05412 1/20 0.33
▸ NFKB1 P19838 1/20 0.33
▸ BACE1 P56817 1/20 0.33
▸ ACHE P22303 1/20 0.33
▸ ESR1 P03372 1/20 0.33
▸ ITGB3 P05106 1/20 0.33
▸ ITGA2B P08514 1/20 0.33
▸ HMGB1 P09429 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110665 0.82 TNFSF11 (0.47) PTGS1TNFSF11KDM4ETSHRALDH1A1
SCHEMBL22991505 0.77 TOP1 (0.37) PTGS1TNFSF11KDM4ETSHRALDH1A1
SCHEMBL22991600 0.75 JUN (0.44) PTGS1KDM4ETSHRALDH1A1GAA
SCHEMBL3681025 0.72 KMT2A (0.47) PTGS1KDM4ETSHRALDH1A1GAA
SCHEMBL22991509 0.71 POLB (0.38) PTGS1KDM4EGAAALOX5TOP1
SCHEMBL22991412 0.71 JUN (0.41) PTGS1TNFSF11KDM4ETSHRALDH1A1
SCHEMBL22991507 0.71 POLB (0.35) PTGS1KDM4EGAATOP1BACE1
SCHEMBL22991542 0.71 POLB (0.35) PTGS1KDM4EGAATOP1BACE1
SCHEMBL22991510 0.71 POLB (0.44) PTGS1KDM4EGAATOP1BACE1
SCHEMBL24110535 0.70 ALDH1A1 (0.55) PTGS1TNFSF11KDM4ETSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 — — WO disclosed
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