SCHEMBL22991663

SCHEMBL22991663

C=Cc1cc(C)c(O)c(I)c1

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TTR P02766 3/20 0.42
PTGS1 P23219 9/20 0.39
PTGS2 P35354 9/20 0.39
ALOX5 P09917 9/20 0.39
CYP2C9 P11712 2/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2B6 P20813 1/20 0.39
EEF2K O00418 1/20 0.37
SRC P12931 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
ALB P02768 1/20 0.35
EGFR P00533 1/20 0.35
ERBB2 P04626 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21045991 0.91 TTR (0.50) TTRALB
SCHEMBL220820 0.86 PTGS1 (0.50) TTRPTGS1PTGS2ALOX5CYP2C9
SCHEMBL22991515 0.80 TTR (0.39) TTRPTGS1CYP2C9CYP3A4ALB
SCHEMBL18677460 0.80 TP53 (0.35)
SCHEMBL26348257 0.80 EGFR (0.53) TTRPTGS1PTGS2ALOX5CYP2C9
SCHEMBL6740604 0.78 ERN1 (0.45) TTRPTGS1PTGS2ALOX5CYP2C9
SCHEMBL25140015 0.77 PTGS1 (0.47) TTRPTGS1PTGS2ALOX5CYP2C9
SCHEMBL30973191 0.77 TTR (0.41) TTRCYP2C9CYP1A2ALB
SCHEMBL25142209 0.77 PTGS1 (0.49) TTRPTGS1PTGS2ALOX5CYP2C9
SCHEMBL9149322 0.77 PTGS1 (0.38) TTRPTGS1PTGS2ALOX5CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024135708-A1 METHOD FOR PRODUCING COMPOUND, POLYMER, COMPOSITION, AND PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2024-06-27 WO disclosed
US-20230348351-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-11-02 US disclosed
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230348351-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND PHOSPHO1, RER1, RIF1 TTR 1045/4885PTGS1 2324/4885PTGS2 3294/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.