SCHEMBL23009807

SCHEMBL23009807

C=C(C)C(=O)NCCc1cc(O)cc(O)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.47
F13A1 P00488 1/20 0.47
ALDH1A1 P00352 2/20 0.44
LMNA P02545 2/20 0.44
MAPT P10636 1/20 0.44
HPGD P15428 1/20 0.44
PTGS1 P23219 1/20 0.44
BLM P54132 1/20 0.44
HIF1A Q16665 1/20 0.44
HSD17B10 Q99714 1/20 0.44
HSP90AB1 P08238 1/20 0.42
SPR P35270 1/20 0.41
PTGS2 P35354 3/20 0.40
CYP3A4 P08684 1/20 0.40
ABCG2 Q9UNQ0 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20746326 0.84 KDM4E (0.50) KDM4EF13A1ALDH1A1LMNAMAPT
SCHEMBL17041929 0.83 PTGS1 (0.41) KDM4EF13A1ALDH1A1LMNAMAPT
SCHEMBL105520 0.82 KDM4E (0.71) KDM4EF13A1ALDH1A1LMNAMAPT
SCHEMBL19367008 0.79 MEN1 (0.49) ALDH1A1MAPTPLAAT5PLAAT4PLAAT3
SCHEMBL30446328 0.78 MAPT (0.73) KDM4EALDH1A1LMNAMAPTHPGD
SCHEMBL400288 0.78 MAPT (0.73) KDM4EALDH1A1LMNAMAPTHPGD
SCHEMBL1027805 0.76 SMN1; SMN2 (0.64) KDM4EALDH1A1MAPTHPGDCYP3A4
SCHEMBL9962893 0.76 MAPT (0.56) KDM4EF13A1ALDH1A1LMNAMAPT
SCHEMBL22882556 0.75 POLB (0.50) KDM4EF13A1ALDH1A1LMNAMAPT
SCHEMBL10137210 0.74 SMN1; SMN2 (0.60) KDM4EF13A1ALDH1A1HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3779596-A1 NEGATIVE-TYPE PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2021-02-17 EP disclosed