⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4237356 | 0.90 | — | — | |
| SCHEMBL8762300 | 0.87 | — | — | |
| SCHEMBL17373044 | 0.83 | — | — | |
| SCHEMBL8575941 | 0.83 | — | — | |
| SCHEMBL13849903 | 0.83 | — | — | |
| SCHEMBL17373038 | 0.79 | — | — | |
| SCHEMBL1710535 | 0.78 | — | — | |
| SCHEMBL1494467 | 0.75 | — | — | |
| SCHEMBL12134329 | 0.75 | LMNA (0.45) | — | |
| SCHEMBL20895866 | 0.75 | LMNA (0.45) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9196484-B2 | Silicon-containing composition for formation of resist underlayer film, which contains organic group containing protected aliphatic alcohol | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-24 | — | — | US | disclosed |
| US-20130183830-A1 | SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-18 | — | — | US | disclosed |
| EP-1725669-B1 | METHOD FOR PRODUCING ORGANIC MOLECULES USING HYDROLASES | DOW CORNING (US) | 2011-08-03 | — | — | EP | disclosed |
| EP-1725669-A4 | METHODS FOR FORMING STRUCTURALLY DEFINED ORGANIC MOLECULES | DOW CORNING (US) | 2009-04-29 | — | — | EP | disclosed |
| US-7455998-B2 | Methods for forming structurally defined organic molecules | DOW CORNING CORPORATION (US) | 2008-11-25 | — | — | US | disclosed |
| US-7455998-B2 | Methods for forming structurally defined organic molecules | DOW CORNING CORPORATION (US) | 2008-11-25 | — | — | US | disclosed |
| EP-1725669-A1 | METHODS FOR FORMING STRUCTURALLY DEFINED ORGANIC MOLECULES | Dow Corning Corporation (US) | 2006-11-29 | — | — | EP | disclosed |
| WO-2005085459-A1 | METHODS FOR FORMING STRUCTURALLY DEFINED ORGANIC MOLECULES | DOW CORNING CORPORATION (US) | 2005-09-15 | — | — | WO | disclosed |
| US-20050196849-A1 | Methods for forming structurally defined organic molecules | DOW CORNING CORPORATION | 2005-09-08 | — | — | US | disclosed |