SCHEMBL230727

SCHEMBL230727

C=C(CC(C)(C)C)C(=O)OCCO

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.38
THRB P10828 1/20 0.33
ACHE P22303 1/20 0.32
TET2 Q6N021 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5885496 0.83 CYP4F2 (0.35) TSHRTHRB
SCHEMBL19218033 0.83 TSHR (0.34) TSHRTHRBACHE
SCHEMBL3304585 0.83 THRB (0.42) TSHRTHRBTET2
SCHEMBL2670066 0.82 THRB (0.53) TSHRTHRBTET2
SCHEMBL109338 0.82 THRB (0.32) TSHRTHRBTET2
SCHEMBL27845822 0.82 TSHR (0.39) TSHRTHRB
SCHEMBL4918861 0.79 KDM4E (0.32) TSHRTHRB
SCHEMBL10609077 0.79 CHRM1 (0.46) TSHRTHRB
SCHEMBL12130916 0.79 ALDH1A1 (0.45) TSHRTHRBTET2
SCHEMBL29117751 0.78 TSHR (0.61) TSHRACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 912 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121574335-A Photo-curing resin, high-toughness adhesive product and preparation method thereof 万华化学集团股份有限公司 2026-02-27 CN claimed
CN-120025501-A Photo-curing hand paste resin system for low-temperature environment in winter and preparation method thereof 重庆胜科检测技术有限公司 2025-05-23 CN claimed
CN-119912839-A Preparation method of electron beam radiation curing gravure printing ink 北京印刷学院 2025-05-02 CN claimed
CN-119798607-A Preparation method and application of photo-curing resin 万华化学集团股份有限公司 2025-04-11 CN claimed
CN-116574412-B Preparation method of flame-retardant UV (ultraviolet) inkjet ink 浙江浦江永进工贸有限公司 2024-07-02 CN claimed
CN-116574412-A Preparation method of flame-retardant UV (ultraviolet) inkjet ink 浙江浦江永进工贸有限公司 2023-08-11 CN claimed
CN-116239974-A Film material and conductive adhesive film using the same 南通德聚半导体材料有限公司 2023-06-09 CN claimed
CN-115561965-A Solder resist dry film capable of resisting chemical reagent and preparation method thereof 广东硕成科技股份有限公司 2023-01-03 CN claimed
US-11512235-B2 Adhesive composition and polarizing plate comprising adhesive layer formed using same SHANJIN OPTOELECTRONICS (SUZHOU) CO., LTD. (CN) 2022-11-29 US claimed
CN-114806597-A Liquid crystal composition, liquid crystal handwriting film and liquid crystal handwriting board 深圳市小柔科技有限公司 2022-07-29 CN claimed
EP-1767558-A1 Radiation-curable polyurethane resin compositions with controlled structures Air Products and Chemicals, Inc. (US) 2007-03-28 EP claimed
US-20070066751-A1 Radiation-curable polyurethane resin compositions with controlled structures AIR PRODUCTS AND CHEMICALS, INC. 2007-03-22 US claimed
CN-1193083-C Connecting material SONY CHEMICALS CO LTD (JP) 2005-03-16 CN claimed
US-6777478-B2 CONNECTING INTEGRATED CIRCUITS; BLEND OF THERMOPLASTIC RESIN AND CURING AGENT SONY CHEMICALS CORPORATION (JP) 2004-08-17 US claimed
EP-0222059-B1 IMPROVED RADIATION-HARDENABLE DILUENTS HENKEL CORPORATION (a Delaware corp.) (US) 1992-07-08 EP claimed
US-5110889-A Lower alkyl ether acrylates of polyols; coatings DIAMOND SHAMROCK CHEMICAL CO. (US) 1992-05-05 US claimed
US-4876384-A ALKYL ETHER ACRYLATES AND METHACRYLATES OF ALKOXYLATED AND NONALKOXYLATED POLYOLS; LOW VISCOSITY; SHRINKAGE INHIBITION DIAMOND SHAMROCK CHEMICALS CO. (US) 1989-10-24 US claimed
US-4678846-A HIGH AND LOW MOLECULAR WEIGHT TH. GOLDSCHMIDT AG (DE) 1987-07-07 US claimed
EP-0222059-A2 Improved radiation-hardenable diluents HENKEL CORPORATION (a Delaware corp.) (US) 1987-05-20 EP claimed
US-4192684-A Photosensitive compositions containing hydrogenated 1,2-polybutadiene ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-03-11 US claimed