Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 3/20 | 0.43 |
| ▸ | KCNA3 | P22001 | 3/20 | 0.40 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.40 |
| ▸ | TLR8 | Q9NR97 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | GPBAR1 | Q8TDU6 | 1/20 | 0.39 |
| ▸ | CNR1 | P21554 | 2/20 | 0.38 |
| ▸ | CNR2 | P34972 | 2/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | SCN1A | P35498 | 1/20 | 0.37 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.37 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.37 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.37 |
| ▸ | FAAH | O00519 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29371366 | 1.00 | KCNH2 (0.43) | KCNH2KCNA3SLC2A1TLR8TDP1 | |
| SCHEMBL29368965 | 0.99 | KCNA3 (0.42) | KCNH2KCNA3SLC2A1TLR8TDP1 | |
| SCHEMBL29371284 | 0.99 | KCNA3 (0.42) | KCNH2KCNA3SLC2A1TLR8TDP1 | |
| SCHEMBL29372711 | 0.99 | KCNA3 (0.42) | KCNH2KCNA3SLC2A1TLR8TDP1 | |
| SCHEMBL23089966 | 0.99 | KCNA3 (0.42) | KCNH2KCNA3SLC2A1TLR8TDP1 | |
| SCHEMBL23089897 | 0.99 | KCNA3 (0.42) | KCNH2KCNA3SLC2A1TLR8TDP1 | |
| SCHEMBL23089899 | 0.99 | KCNA3 (0.42) | KCNH2KCNA3SLC2A1TLR8TDP1 | |
| SCHEMBL23089914 | 0.96 | KCNH2 (0.46) | KCNH2KCNA3SLC2A1TLR8TDP1 | |
| SCHEMBL29371892 | 0.96 | KCNH2 (0.46) | KCNH2KCNA3SLC2A1TLR8TDP1 | |
| SCHEMBL23089972 | 0.91 | L3MBTL1 (0.41) | KCNH2SLC2A1TLR8TDP1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109471330-B | Photosensitive composition and photopolymerization initiator used therein | 东京应化工业株式会社 | 2023-08-29 | — | — | CN | disclosed |
| US-11352450-B2 | Photopolymerization sensitizer composition | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2022-06-07 | — | — | US | disclosed |
| CN-111868105-B | Photopolymerizable sensitizer composition | 川崎化成工业株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-106970503-B | Photosensitive composition | 东京应化工业株式会社 | 2022-02-01 | — | — | CN | disclosed |
| US-20210079127-A1 | PHOTOPOLYMERIZATION SENSITIZER COMPOSITION | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2021-03-18 | — | — | US | disclosed |
| CN-112394617-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2021-02-23 | — | — | CN | disclosed |
| CN-111868105-A | Photopolymerizable sensitizer composition | 川崎化成工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-111796482-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-10-20 | — | — | CN | disclosed |
| CN-111240156-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-06-05 | — | — | CN | disclosed |
| CN-110955114-A | Photosensitive resin composition, method for producing patterned cured film, and cured film | 东京应化工业株式会社 | 2020-04-03 | — | — | CN | disclosed |