SCHEMBL23089972

SCHEMBL23089972

CCCOc1c2ccccc2cc2ccc(Cl)cc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.41
MAPT P10636 1/20 0.41
PKM P14618 1/20 0.41
KCNH2 Q12809 2/20 0.39
CYP2A6 P11509 1/20 0.39
DHODH Q02127 1/20 0.38
BTK Q06187 1/20 0.37
SLC2A1 P11166 1/20 0.36
TLR8 Q9NR97 1/20 0.36
GPBAR1 Q8TDU6 1/20 0.35
CYSLTR1 Q9Y271 1/20 0.35
CNR1 P21554 1/20 0.35
CNR2 P34972 1/20 0.35
KMT2A Q03164 2/20 0.35
MEN1 O00255 1/20 0.35
TSHR P16473 1/20 0.35
PTGER1 P34995 1/20 0.35
GAA P10253 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CRHR1 P34998 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29372694 1.00 L3MBTL1 (0.41) L3MBTL1MAPTPKMKCNH2CYP2A6
SCHEMBL23089914 0.93 KCNH2 (0.46) L3MBTL1KCNH2CYP2A6SLC2A1TLR8
SCHEMBL29371892 0.93 KCNH2 (0.46) L3MBTL1KCNH2CYP2A6SLC2A1TLR8
SCHEMBL29371366 0.91 KCNH2 (0.43) L3MBTL1KCNH2CYP2A6SLC2A1TLR8
SCHEMBL23089945 0.91 KCNH2 (0.43) L3MBTL1KCNH2CYP2A6SLC2A1TLR8
SCHEMBL23089966 0.90 KCNA3 (0.42) L3MBTL1MAPTKCNH2SLC2A1TLR8
SCHEMBL29368965 0.90 KCNA3 (0.42) L3MBTL1MAPTKCNH2SLC2A1TLR8
SCHEMBL23089899 0.90 KCNA3 (0.42) L3MBTL1MAPTKCNH2SLC2A1TLR8
SCHEMBL23089897 0.90 KCNA3 (0.42) L3MBTL1MAPTKCNH2SLC2A1TLR8
SCHEMBL29372711 0.90 KCNA3 (0.42) L3MBTL1MAPTKCNH2SLC2A1TLR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US disclosed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US disclosed
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 CN disclosed
CN-111868105-A Photopolymerizable sensitizer composition 川崎化成工业株式会社 2020-10-30 CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 CN disclosed
CN-111240156-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-06-05 CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 CN disclosed