Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FASN | P49327 | 2/20 | 0.65 |
| ▸ | CA12 | O43570 | 1/20 | 0.57 |
| ▸ | CA1 | P00915 | 1/20 | 0.57 |
| ▸ | CA2 | P00918 | 1/20 | 0.57 |
| ▸ | CA6 | P23280 | 1/20 | 0.57 |
| ▸ | CA9 | Q16790 | 1/20 | 0.57 |
| ▸ | DYRK1A | Q13627 | 3/20 | 0.56 |
| ▸ | CLK1 | P49759 | 2/20 | 0.56 |
| ▸ | DYRK1B | Q9Y463 | 2/20 | 0.56 |
| ▸ | PARP1 | P09874 | 1/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.52 |
| ▸ | EGLN2 | Q96KS0 | 1/20 | 0.52 |
| ▸ | HSD17B1 | P14061 | 6/20 | 0.51 |
| ▸ | HSD17B2 | P37059 | 5/20 | 0.51 |
| ▸ | STS | P08842 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | USP2 | O75604 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6847967 | 0.91 | FASN (0.64) | FASNCA12CA1CA2CA6 | |
| SCHEMBL8861241 | 0.89 | FASN (0.66) | FASNCA12CA1CA2CA6 | |
| SCHEMBL809540 | 0.84 | FASN (0.76) | FASNCA12CA1CA2CA6 | |
| SCHEMBL29699163 | 0.84 | FASN (0.76) | FASNCA12CA1CA2CA6 | |
| SCHEMBL353943 | 0.83 | FASN (0.64) | FASNDYRK1ACLK1DYRK1BPARP1 | |
| SCHEMBL8861197 | 0.83 | FASN (0.74) | FASNCA12CA1CA2CA6 | |
| SCHEMBL21935597 | 0.82 | FASN (0.68) | FASNCA12CA1CA2CA6 | |
| SCHEMBL8535254 | 0.81 | FASN (0.66) | FASNCA12CA1CA2CA6 | |
| SCHEMBL21936712 | 0.81 | FASN (0.66) | FASNCA12CA1CA2CA6 | |
| SCHEMBL9638514 | 0.80 | FASN (0.60) | FASNCA12CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101355056-B | Method for manufacturing thin film transistor substrate and photosensitive composition used in the substrate | SAMSUNG DISPLAY CO LTD | 2014-02-26 | — | — | CN | claimed |
| CN-120158100-A | Preparation method of high-temperature-resistant corrosion-resistant alloy rubber | 上海焦能新材料有限公司 | 2025-06-17 | — | — | CN | disclosed |
| CN-117986663-A | High-temperature-resistant corrosion-resistant alloy rubber and preparation method thereof | 上海焦能新材料有限公司 | 2024-05-07 | — | — | CN | disclosed |
| CN-108732868-B | Positive resist film laminate and pattern forming method | 信越化学工业株式会社 | 2022-12-13 | — | — | CN | disclosed |
| US-10719015-B2 | Positive resist film laminate and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-21 | — | — | US | disclosed |
| WO-2020142450-A1 | POLYMER COMPOSITIONS COMPRISING COMPOUNDS DERIVED FROM BIOLOGY | ZYMERGEN INC. (US) | 2020-07-09 | — | — | WO | disclosed |
| EP-3392708-B1 | POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-03-18 | — | — | EP | disclosed |
| US-20180312886-A1 | MICROBIAL PRODUCTION OF CHEMICAL PRODUCTS AND RELATED COMPOSITIONS, METHODS AND SYSTEMS | CARGILL INC (US) | 2018-11-01 | — | — | US | disclosed |
| US-20180312887-A1 | MICROBIAL PRODUCTION OF CHEMICAL PRODUCTS AND RELATED COMPOSITIONS, METHODS AND SYSTEMS | CARGILL INC (US) | 2018-11-01 | — | — | US | disclosed |
| EP-3392708-A1 | POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-10-24 | — | — | EP | disclosed |
| EP-0369219-A1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-05-23 | — | — | EP | disclosed |
| US-4902785-A | Phenolic photosensitizers containing quinone diazide and acidic halide substituents | HOECHST CELANESE CORPORATION (US) | 1990-02-20 | — | — | US | disclosed |
| US-4892801-A | PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1990-01-09 | — | — | US | disclosed |
| US-4863827-A | O-QUINONE DIAZIDE | AMERICAN HOECHST CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| EP-0264845-A2 | Multilayer positive-registration material | HOECHST CELANESE CORPORATION (US) | 1988-04-27 | — | — | EP | disclosed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| EP-0244763-A2 | Positive-working photosensitive composition and photosensitive recording material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0244762-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0243964-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-04 | — | — | EP | disclosed |