SCHEMBL8535254

SCHEMBL8535254

O=C(c1cccc(O)c1)c1cc(O)cc(O)c1O

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FASN P49327 1/20 0.66
MEN1 O00255 1/20 0.56
USP2 O75604 1/20 0.56
GAA P10253 1/20 0.56
KMT2A Q03164 1/20 0.56
KEAP1 Q14145 1/20 0.56
NFE2L2 Q16236 1/20 0.56
DYRK1A Q13627 3/20 0.50
CLK1 P49759 2/20 0.50
DYRK1B Q9Y463 2/20 0.50
CA12 O43570 1/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA6 P23280 1/20 0.50
CA9 Q16790 1/20 0.50
HSD17B1 P14061 4/20 0.49
HSD17B2 P37059 4/20 0.49
SIRT1 Q96EB6 1/20 0.49
PARP1 P09874 1/20 0.48
STS P08842 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7781091 0.86 FASN (0.66) FASNMEN1USP2GAAKMT2A
SCHEMBL8861243 0.85 MEN1 (0.70) FASNMEN1USP2GAAKMT2A
SCHEMBL7713702 0.85 MEN1 (0.76) FASNMEN1USP2GAAKMT2A
SCHEMBL7720770 0.84 FASN (0.62) FASNMEN1USP2GAAKMT2A
SCHEMBL14991108 0.83 FASN (0.61) FASNMEN1USP2GAAKMT2A
SCHEMBL351277 0.82 HDAC1 (0.62) FASNMEN1USP2GAAKMT2A
SCHEMBL29557325 0.82 HDAC1 (0.62) FASNMEN1USP2GAAKMT2A
SCHEMBL7713698 0.81 FASN (0.59) FASNMEN1USP2GAAKMT2A
SCHEMBL2315545 0.81 FASN (0.65) FASNMEN1USP2GAAKMT2A
1-Naphthol SCHEMBL9854465 0.80 MEN1 (0.54) FASNMEN1USP2GAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5726217-A PHOTOSENSITIZERS FOR POSITIVE RESISTS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1998-03-10 US disclosed
US-5686557-A Polyamide resin which can be dissolved in alcohol solvent, composition thereof, and method of use thereof TOMOEGAWA PAPER CO., LTD. (JP) 1997-11-11 US disclosed