Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FASN | P49327 | 1/20 | 0.64 |
| ▸ | MEN1 | O00255 | 4/20 | 0.62 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.62 |
| ▸ | GAA | P10253 | 2/20 | 0.62 |
| ▸ | USP2 | O75604 | 1/20 | 0.62 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.62 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | ATM | Q13315 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.52 |
| ▸ | LMNA | P02545 | 3/20 | 0.52 |
| ▸ | RAB9A | P51151 | 2/20 | 0.52 |
| ▸ | SLC5A1 | P13866 | 2/20 | 0.52 |
| ▸ | SLC5A2 | P31639 | 2/20 | 0.52 |
| ▸ | POLB | P06746 | 2/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.51 |
| ▸ | NPC1 | O15118 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3656921 | 0.88 | FASN (0.73) | FASNMEN1KMT2AGAAUSP2 | |
| SCHEMBL6847967 | 0.86 | FASN (0.64) | FASNMEN1KMT2AGAAUSP2 | |
| SCHEMBL8965058 | 0.86 | CYP3A4 (0.63) | FASNMEN1KMT2AGAAUSP2 | |
| SCHEMBL21178163 | 0.84 | MEN1 (0.81) | FASNMEN1KMT2AGAAUSP2 | |
| Iriflophenone SCHEMBL9148205 | 0.84 | FASN (0.67) | FASNMEN1KMT2AGAAUSP2 | |
| SCHEMBL25707508 | 0.83 | MEN1 (0.50) | FASNMEN1KMT2AGAAUSP2 | |
| SCHEMBL2315545 | 0.83 | FASN (0.65) | FASNMEN1KMT2AGAAUSP2 | |
| SCHEMBL1456378 | 0.82 | HPGD (0.68) | MEN1KMT2AGAAUSP2ALDH1A1 | |
| SCHEMBL3656913 | 0.82 | FASN (0.58) | FASNMEN1KMT2AGAAUSP2 | |
| SCHEMBL30550350 | 0.82 | ALDH1A1 (0.56) | MEN1KMT2AGAAUSP2KEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1301 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119439618-A | Negative photosensitive resin composition, preparation method thereof and hardening film | 深圳市道尔顿电子材料股份有限公司 | 2025-02-14 | — | — | CN | claimed |
| CN-112731765-B | Fluorine-containing resin composition, preparation method thereof and preparation method of cured film containing fluorine-containing resin composition | 西安瑞联新材料股份有限公司 | 2024-03-26 | — | — | CN | claimed |
| US-20230407114-A1 | THREE-DIMENSIONAL PRINTING | PERIDOT PRINT LLC | 2023-12-21 | — | — | US | claimed |
| CN-112888498-B | Composition useful for making acid gas separation membranes | 住友化学株式会社 | 2023-07-14 | — | — | CN | claimed |
| US-20230194984-A1 | FLUORINE-CONTAINING RESIN COMPOSITION AND PREPARATION METHOD THEREOF, AND PREPARATION METHOD OF CURED FILM CONTAINING SAME | XI'AN MANARECO NEW MATERIALS CO., LTD. (CN) | 2023-06-22 | — | — | US | claimed |
| WO-2022142537-A1 | FLUORINE-CONTAINING RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND PREPARATION METHOD FOR CURED FILM CONTAINING SAME | 西安瑞联新材料股份有限公司 | 2022-07-07 | — | — | WO | claimed |
| WO-2022115112-A1 | THREE-DIMENSIONAL PRINTING | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2022-06-02 | — | — | WO | claimed |
| CN-112731765-A | Fluorine-containing resin composition, preparation method thereof and preparation method of cured film containing fluorine-containing resin composition | 西安瑞联新材料股份有限公司 | 2021-04-30 | — | — | CN | claimed |
| US-10494483-B2 | Photosensitive resin composition, organic light emitting display device including the same, and method for manufacturing organic light emitting display device | SAMSUNG DISPLAY CO., LTD. (KR) | 2019-12-03 | — | — | US | claimed |
| US-10409162-B2 | Highly heat resistant polysilsesquioxane-based photosensitive resin composition | LTC CO., LTD. (KR) | 2019-09-10 | — | — | US | claimed |
| US-20040197696-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| EP-0395346-B1 | Photosensitive composition | FUJI PHOTO FILM CO LTD (JP) | 1996-11-27 | — | — | EP | claimed |
| US-5254432-A | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-19 | — | — | US | claimed |
| EP-0503402-A1 | Coloured positive working light sensitive recording material and process for the production of a colour proofing image using this material | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-09-16 | — | — | EP | claimed |
| US-5089373-A | High resolving power, sensitivity | FUJI PHOTO FILM CO., LTD. (JP) | 1992-02-18 | — | — | US | claimed |
| EP-0395346-A2 | Photosensitive composition | Fuji Photo Film Co., Ltd. (JP) | 1990-10-31 | — | — | EP | claimed |
| US-4308368-A | PHOTORESISTS, PRINTING PLATES, STORAGE STABILITY | DAICEL CHEMICAL INDUSTRIES LTD. (JP) | 1981-12-29 | — | — | US | claimed |