SCHEMBL231670

SCHEMBL231670

CC1=CCC(O)(O)C=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2466483 0.78
SCHEMBL8337731 0.78
SCHEMBL28570049 0.78 HSD11B1 (0.33)
SCHEMBL29264263 0.76
SCHEMBL29518186 0.75 HSD11B1 (0.33)
SCHEMBL6369664 0.75
SCHEMBL1036902 0.73
SCHEMBL4369108 0.73 HSD11B1 (0.33)
SCHEMBL30687007 0.73 HSD11B1 (0.33)
SCHEMBL29086601 0.73 HSD11B1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4341320-A1 POLYURETHANE DISPERSANTS, PIGMENT DISPERSIONS AND AQUEOUS INKS Sun Chemical Corporation (US) 2024-03-27 EP claimed
US-20240076515-A1 POLYURETHANE DISPERSANTS, PIGMENT DISPERSIONS AND AQUEOUS INKS SUN CHEMICAL CORPORATION 2024-03-07 US claimed
WO-2022246037-A1 POLYURETHANE DISPERSANTS, PIGMENT DISPERSIONS AND AQUEOUS INKS SUN CHEMICAL CORPORATION (US) 2022-11-24 WO claimed
CN-122060245-A Antistatic resin composition 东邦化学工业株式会社 2026-05-19 CN disclosed
US-20250382482-A1 AQUEOUS INK, INK CARTRIDGE AND INK JET RECORDING METHOD CANON KK (JP) 2025-12-18 US disclosed
US-20250289970-A1 Ink Jet Ink Composition SEIKO EPSON CORPORATION (JP) 2025-09-18 US disclosed
EP-4321583-B1 AQUEOUS INK, INK CARTRIDGE AND INK JET RECORDING METHOD CANON KK (JP) 2025-04-09 EP disclosed
US-20250084268-A1 Ink Jet Ink Composition And Recording Method SEIKO EPSON CORPORATION (JP) 2025-03-13 US disclosed
US-20240408863-A1 INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS CANON KK (JP) 2024-12-12 US disclosed
US-20240254357-A1 Ink Set And Recording Method SEIKO EPSON CORPORATION (JP) 2024-08-01 US disclosed
US-12031048-B2 Ink set and recording method SEIKO EPSON CORPORATION (JP) 2024-07-09 US disclosed
WO-2012132305-A1 INK JET INK, INK CARTRIDGE, AND INK JET RECORDING METHOD CANON KABUSHIKI KAISHA (JP) 2012-10-04 WO disclosed
US-20120001980-A1 INK JET INK, INK JET RECORDING METHOD, AND INK CARTRIDGE CANON KABUSHIKI KAISHA (JP) 2012-01-05 US disclosed
US-7371455-B2 Laminates and packaging containers KYDO PRINTING CO., LTD. (JP) 2008-05-13 US disclosed
US-7118800-B2 Skin layer with a glass transition point of 85-115 degrees C.composed of a copolymer of 2,6-naphthalenedicarboxylic acid, terephthalic acid and ethylene glycol or an alloy of polyethylene terephthalate and polyethylene-2,6-naphthalate; core layer of thermoplastic polyester/heat resistant resin alloy KYODO PRINTING CO., LTD. (JP) 2006-10-10 US disclosed
US-20060204695-A1 Laminates and packaging containers KYODO PRINTING CO., LTD. (JP) 2006-09-14 US disclosed
US-20050084695-A1 Laminates and packaging containers KYODO PRINTING CO., LTD. (JP) 2005-04-21 US disclosed
EP-1447216-A1 LAMINATES AND PACKAGING CONTAINERS Kyodo Printing Co., Ltd. (JP) 2004-08-18 EP disclosed
EP-0450009-A1 PROCESS FOR MANUFACTURING BISPHENOLS OWAFIN AG (CH) 1991-10-09 EP disclosed
WO-1991005755-A1 PROCESS FOR MANUFACTURING BISPHENOLS OWAFIN AG (CH) 1991-05-02 WO disclosed