⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23252700 | 0.92 | GAA (0.36) | — | |
| SCHEMBL23229304 | 0.88 | MMP13 (0.33) | — | |
| SCHEMBL24592682 | 0.83 | — | — | |
| SCHEMBL22365120 | 0.81 | SMN1; SMN2 (0.41) | — | |
| SCHEMBL20962093 | 0.81 | — | — | |
| SCHEMBL21943334 | 0.81 | GAA (0.31) | — | |
| SCHEMBL18601834 | 0.78 | HTR6 (0.46) | — | |
| SCHEMBL21765452 | 0.74 | FFAR4 (0.34) | — | |
| SCHEMBL24080799 | 0.73 | TDP1 (0.33) | — | |
| SCHEMBL24716839 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021065450-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2021-04-08 | — | — | WO | disclosed |