⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5687077 | 0.92 | OPRM1 (0.48) | — | |
| SCHEMBL5684275 | 0.89 | MAPT (0.46) | — | |
| SCHEMBL5683362 | 0.89 | MAPT (0.46) | — | |
| SCHEMBL5684466 | 0.89 | MAPT (0.46) | — | |
| SCHEMBL5683740 | 0.89 | MAPT (0.46) | — | |
| SCHEMBL5686742 | 0.89 | MAPT (0.46) | — | |
| SCHEMBL11067866 | 0.89 | MAPT (0.46) | — | |
| SCHEMBL5683882 | 0.89 | MAPT (0.46) | — | |
| SCHEMBL2330688 | 0.81 | — | — | |
| SCHEMBL3185161 | 0.81 | DNM1 (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3372581-B1 | FULLERENE DERIVATIVE AND n-TYPE SEMICONDUCTOR MATERIAL | DAIKIN IND LTD (JP) | 2021-06-23 | — | — | EP | disclosed |
| US-10894770-B2 | Fullerene derivative and n-type semiconductor material | DAIKIN INDUSTRIES, LTD. (JP) | 2021-01-19 | — | — | US | disclosed |
| EP-3191471-B1 | 4,5-DIHYDROPYRAZOLE DERIVATIVES, PHARMACEUTICAL COMPOSITIONS CONTAINING THEM, AND THEIR USE IN THERAPY | ABBVIE DEUTSCHLAND (DE) | 2020-03-11 | — | — | EP | disclosed |
| US-20180282274-A1 | FULLERENE DERIVATIVE AND n-TYPE SEMICONDUCTOR MATERIAL | DAIKIN INDUSTRIES, LTD. (JP) | 2018-10-04 | — | — | US | disclosed |
| EP-3372581-A1 | FULLERENE DERIVATIVE AND n-TYPE SEMICONDUCTOR MATERIAL | Daikin Industries, Ltd. (JP) | 2018-09-12 | — | — | EP | disclosed |
| CN-108137498-A | Fullerene derivate and n-type semiconductor | 大金工业株式会社 | 2018-06-08 | — | — | CN | disclosed |
| US-9550754-B2 | 4,5-dihydropyrazole derivatives, pharmaceutical compositions containing them, and their use in therapy | AbbVie Deutschland GmbH & Co. KG (DE) | 2017-01-24 | — | — | US | disclosed |
| US-20160235062-A1 | COPOLYMERS AND COMPOSITIONS WITH ANTI-ADHESIVE AND ANTIMICROBIAL PROPERTIES | BASF SE (DE) | 2016-08-18 | — | — | US | disclosed |
| US-20160075691-A1 | 4,5- DIHYDROPYRAZOLE DERIVATIVES, PHARMACEUTICAL COMPOSITIONS CONTAINING THEM, AND THEIR USE IN THERAPY | AbbVie Deutschland GmbH & Co. KG (DE) | 2016-03-17 | — | — | US | disclosed |
| US-9242933-B2 | Heterocyclic compounds as positive modulators of metabotropic glutamate receptor 2 (mGlu2 receptor) | AbbVie Deutschland GmbH & Co. KG (DE) | 2016-01-26 | — | — | US | disclosed |
| US-20050208425-A1 | Imide compound and optical recording media made by using the same | YAMAMOTO CHEMICALS, INC. (JP) | 2005-09-22 | — | — | US | disclosed |
| EP-1180765-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS INC (JP) | 2005-04-06 | — | — | EP | disclosed |
| EP-1445115-A1 | IMIDE COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME | Mitsui Chemicals, Inc. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-6627288-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS, INC. (JP) | 2003-09-30 | — | — | US | disclosed |
| US-20030091931-A1 | Benzbisazole compound and optical recording medium containing the compound | MITSUI CHEMICALS, INC. (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-1245571-A1 | BENZBISAZOLE COMPOUND AND OPTICAL RECORDING MEDIUM CONTAINING THE COMPOUND | Mitsui Chemicals, Inc. (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1201632-A1 | FUSED RING COMPOUND | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2002-05-02 | — | — | EP | disclosed |
| EP-1180765-A1 | Optical recording medium and porphycene compound | Mitsui Chemicals, Inc. (JP) | 2002-02-20 | — | — | EP | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |
| US-4859759-A | Siloxane containing benzotriazolyl/tetraalkylpiperidyl substituent | KIMBERLY-CLARK CORPORATION (US) | 1989-08-22 | — | — | US | disclosed |