SCHEMBL23254337

SCHEMBL23254337

C=C(C)C(=O)OC1C2CC3C(=O)OC1[C@H]3O2

nearest known ligand 0.31

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.31
NPC1 O15118 1/20 0.31
POLB P06746 1/20 0.31
MAPT P10636 1/20 0.31
PKM P14618 1/20 0.31
HTT P42858 1/20 0.31
RECQL P46063 1/20 0.31
RAB9A P51151 1/20 0.31
ATM Q13315 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15492912 1.00 KDM4E (0.31) KDM4ENPC1POLBMAPTPKM
SCHEMBL72688 1.00 KDM4E (0.31) KDM4ENPC1POLBMAPTPKM
SCHEMBL15683097 1.00 KDM4E (0.31) KDM4ENPC1POLBMAPTPKM
SCHEMBL15219196 1.00 KDM4E (0.31) KDM4ENPC1POLBMAPTPKM
SCHEMBL10262923 0.90
SCHEMBL17035924 0.89 MAPK1 (0.36) KDM4EPOLBTDP1
SCHEMBL16775519 0.89
SCHEMBL17247242 0.88 ALDH1A1 (0.33)
SCHEMBL15496094 0.87
SCHEMBL13616603 0.87 TSHR (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3521926-B1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORP (JP) 2021-04-21 EP disclosed