Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | HTT | P42858 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.42 |
| ▸ | P2RX7 | Q99572 | 2/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | DRD4 | P21917 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27572089 | 0.98 | ALDH1A1 (0.49) | ALDH1A1TSHRKMT2APOLBHTT | |
| SCHEMBL27595506 | 0.98 | ALDH1A1 (0.49) | ALDH1A1TSHRKMT2APOLBHTT | |
| SCHEMBL4666990 | 0.76 | KMT2A (0.52) | ALDH1A1TSHRKMT2APOLBHTT | |
| SCHEMBL4409313 | 0.74 | HSD17B10 (0.53) | ALDH1A1TSHRKMT2APOLBHTT | |
| SCHEMBL7795144 | 0.74 | ALDH1A1 (0.50) | ALDH1A1TSHRKMT2APOLBHTT | |
| SCHEMBL23113874 | 0.74 | ALDH1A1 (0.50) | ALDH1A1TSHRKMT2APOLBHTT | |
| SCHEMBL822762 | 0.74 | SMN1; SMN2 (0.55) | ALDH1A1TSHRKMT2APOLBHTT | |
| SCHEMBL544670 | 0.74 | KMT2A (0.61) | ALDH1A1TSHRKMT2APOLBHTT | |
| SCHEMBL5698916 | 0.74 | ALDH1A1 (0.50) | ALDH1A1TSHRKMT2APOLBHTT | |
| SCHEMBL5285566 | 0.74 | ALDH1A1 (0.50) | ALDH1A1TSHRKMT2APOLBHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 276 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117739798-B | Preparation method of flexible resistance type strain sensor, prepared flexible resistance type strain sensor and application of flexible resistance type strain sensor | 暨南大学 | 2024-05-07 | — | — | CN | claimed |
| CN-117739798-A | Preparation method of flexible resistance type strain sensor, prepared flexible resistance type strain sensor and application of flexible resistance type strain sensor | 暨南大学 | 2024-03-22 | — | — | CN | claimed |
| CN-114958206-B | Copper chemical mechanical polishing solution and application thereof and chemical mechanical polishing method | 万华化学集团电子材料有限公司 | 2024-02-02 | — | — | CN | claimed |
| CN-116590711-A | Polishing solution for palladium and copper chemical mechanical polishing and preparation method and application method thereof | 苏州晶晟微纳半导体科技有限公司 | 2023-08-15 | — | — | CN | claimed |
| CN-116288360-A | Non-phosphating polishing additive and production process thereof | 江西宏伟龙科技有限公司 | 2023-06-23 | — | — | CN | claimed |
| CN-113308696-B | Chemical polishing bright additive for chemical polishing of aluminum alloy two acids and polishing process | 昆山市韩铝化学表面材料有限公司 | 2022-12-23 | — | — | CN | claimed |
| CN-115466958-A | Chemical polishing bright additive for chemical polishing of aluminum alloy two acids and polishing process | 安徽韩铝环保新材料有限公司 | 2022-12-13 | — | — | CN | claimed |
| CN-114958206-A | Copper chemical mechanical polishing solution, application thereof and chemical mechanical polishing method | 万华化学集团电子材料有限公司 | 2022-08-30 | — | — | CN | claimed |
| CN-114797807-A | Liquid chromatography stationary phase, preparation method and application thereof | 华谱科仪(大连)科技有限公司 | 2022-07-29 | — | — | CN | claimed |
| CN-114686114-A | Chemical mechanical polishing solution and use method thereof | 安集微电子科技（上海）股份有限公司 | 2022-07-01 | — | — | CN | claimed |
| CN-106928856-A | A kind of acidic chemical machine polishing liquor | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-106928857-A | A kind of acidic chemical machine polishing liquor | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-106928862-A | A kind of chemical mechanical polishing liquid and its polish ULK- copper-connection processing procedures in barrier layer application | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-106928858-A | A kind of chemical mechanical polishing liquid for barrier layer planarization | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-106928855-A | A kind of acidic chemical machine polishing liquor | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-105802512-A | Chemical mechanical polishing liquid and application thereof | 安集微电子（上海）有限公司 | 2016-07-27 | — | — | CN | claimed |
| CN-104745089-A | Chemically mechanical polishing liquid for flattening barrier layer and use method thereof | ANJI MICROELECTRONICS SHANGHAI | 2015-07-01 | — | — | CN | claimed |
| CN-104745090-A | Chemically mechanical polishing liquid and application thereof | ANJI MICROELECTRONICS SHANGHAI | 2015-07-01 | — | — | CN | claimed |
| CN-104745086-A | Chemical mechanical polishing solution for barrier layer planarization, and use method thereof | ANJI MICROELECTRONICS SHANGHAI | 2015-07-01 | — | — | CN | claimed |
| CN-104745088-A | Chemical mechanical polishing solution for barrier layer planarization, and use method thereof | ANJI MICROELECTRONICS SHANGHAI | 2015-07-01 | — | — | CN | claimed |