Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2A | P08913 | 1/20 | 0.40 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.40 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.40 |
| ▸ | ELANE | P08246 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | ESR1 | P03372 | 1/20 | 0.36 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.36 |
| ▸ | ITGA2B | P08514 | 1/20 | 0.36 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | GGT1 | P19440 | 1/20 | 0.36 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19635599 | 0.82 | KCNK3 (0.46) | ADRA2AADRA2BADRA2CALDH1A1KCNK3 | |
| SCHEMBL30526883 | 0.80 | LMNA (0.53) | ELANEKDM4EHSD17B10ALDH1A1TDP1 | |
| SCHEMBL8260079 | 0.80 | LMNA (0.53) | ELANEKDM4EHSD17B10ALDH1A1TDP1 | |
| SCHEMBL7188551 | 0.79 | HTT (0.47) | ADRA2AADRA2BADRA2CELANEKDM4E | |
| SCHEMBL31093097 | 0.77 | CA1 (0.52) | TSHRLMNASMN1; SMN2KCNK3KCNK9 | |
| SCHEMBL1433789 | 0.77 | CA1 (0.52) | TSHRLMNASMN1; SMN2KCNK3KCNK9 | |
| SCHEMBL27476404 | 0.77 | ADRA2A (0.43) | ADRA2AADRA2BADRA2CELANEKDM4E | |
| SCHEMBL282647 | 0.76 | KDM4E (0.58) | ELANEKDM4EHSD17B10ALDH1A1TDP1 | |
| SCHEMBL2154712 | 0.76 | ELANE (0.46) | ELANEKDM4EHSD17B10ALDH1A1TDP1 | |
| SCHEMBL7861711 | 0.75 | KDM4E (0.46) | ADRA2AADRA2BADRA2CELANEKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6465150-B1 | COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | claimed |
| US-5352564-A | Copolymer of styrene derivatives, an acid release agent and a dissolution inhibitor containing an unstable acid group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1994-10-04 | — | — | US | claimed |
| WO-2024020780-A1 | STAR-SHAPED POLYMER, PAINT, COATING, AND METHOD FOR PRODUCING STAR-SHAPED POLYMER | DIC CORPORATION (JP) | 2024-02-01 | — | — | WO | disclosed |
| WO-2022236548-A1 | STAR POLYMER, COATING MATERIAL, COATING FILM, AND METHOD FOR PRODUCING STAR POLYMER | DIC CORPORATION (JP) | 2022-11-17 | — | — | WO | disclosed |
| CN-104822714-B | The manufacture method of polymer | 日本曹达株式会社 | 2017-10-13 | — | — | CN | disclosed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20110198730-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION | 2011-08-18 | — | — | US | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-20080160449-A1 | Photoresist polymer having nano-smoothness and etching resistance, and resist composition | LION CORPORATION (JP) | 2008-07-03 | — | — | US | disclosed |
| US-6465150-B1 | COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | disclosed |
| US-6235446-B1 | MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-0284868-B1 | Photoresist compositions | MICROSI INC (US) | 1995-05-03 | — | — | EP | disclosed |
| US-5352564-A | Copolymer of styrene derivatives, an acid release agent and a dissolution inhibitor containing an unstable acid group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1994-10-04 | — | — | US | disclosed |
| EP-0284868-A2 | Photoresist compositions | MicroSi, Inc. (a Delaware corporation) (US) | 1988-10-05 | — | — | EP | disclosed |