Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRP | O00591 | 3/20 | 0.55 |
| ▸ | GABRD | O14764 | 3/20 | 0.55 |
| ▸ | GABRA1 | P14867 | 3/20 | 0.55 |
| ▸ | GABRB1 | P18505 | 3/20 | 0.55 |
| ▸ | GABRG2 | P18507 | 3/20 | 0.55 |
| ▸ | GABRB3 | P28472 | 3/20 | 0.55 |
| ▸ | GABRA5 | P31644 | 3/20 | 0.55 |
| ▸ | GABRA3 | P34903 | 3/20 | 0.55 |
| ▸ | GABRA2 | P47869 | 3/20 | 0.55 |
| ▸ | GABRB2 | P47870 | 3/20 | 0.55 |
| ▸ | GABRA4 | P48169 | 3/20 | 0.55 |
| ▸ | GABRE | P78334 | 3/20 | 0.55 |
| ▸ | GABRA6 | Q16445 | 3/20 | 0.55 |
| ▸ | GABRG1 | Q8N1C3 | 3/20 | 0.55 |
| ▸ | GABRG3 | Q99928 | 3/20 | 0.55 |
| ▸ | GABRQ | Q9UN88 | 3/20 | 0.55 |
| ▸ | CLCN2 | P51788 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | HMGB1 | P09429 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4116012 | 0.89 | GABRP (0.50) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL14273018 | 0.89 | GABRP (0.47) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL18432461 | 0.85 | GABRP (0.48) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL27411184 | 0.84 | GABRP (0.47) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL21318041 | 0.84 | GABRP (0.47) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL13244501 | 0.84 | GABRP (0.47) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL20724874 | 0.83 | GABRP (0.43) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL5154636 | 0.82 | GABRP (0.46) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL12489052 | 0.82 | GABRP (0.46) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL3526804 | 0.80 | ALOX15 (0.47) | GABRPGABRDGABRA1GABRB1GABRG2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110982083-B | Microporous metal organic framework material used as getter of vacuum insulation board and synthetic method thereof | 浙江华恒复合材料有限公司 | 2022-02-11 | — | — | CN | claimed |
| CN-110982083-A | Microporous metal organic framework material used as getter of vacuum insulation board and synthetic method thereof | 浙江华恒复合材料有限公司 | 2020-04-10 | — | — | CN | claimed |
| CN-122095316-A | Composition for forming resist underlayer film | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2025095106-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-114746468-B | Method for producing polymer | 日产化学株式会社 | 2024-09-13 | — | — | CN | disclosed |
| US-20230103242-A1 | METHOD FOR PRODUCING POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| US-20230029997-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| US-11479627-B2 | Film forming composition containing fluorine-containing surfactant | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-10-25 | — | — | US | disclosed |
| US-11459414-B2 | Film forming composition containing fluorine-containing surfactant | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-10-04 | — | — | US | disclosed |
| CN-114761876-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114746468-A | Method for producing polymer | 日产化学株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-101523292-A | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSAN CHEMICAL IND LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| US-20080038678-A1 | Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| CN-101052919-A | Sulfonate-containing composition for forming anti-reflective coating for lithography | NISSAN CHEMICAL IND LTD (JP) | 2007-10-10 | — | — | CN | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |
| CN-1965268-A | Antireflection film for semiconductor containing condensation type polymer | NISSAN CHEMICAL IND LTD (JP) | 2007-05-16 | — | — | CN | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-3994865-A | MELT SPINNING | CIBA-GEIGY CORPORATION (US) | 1976-11-30 | — | — | US | disclosed |