⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7266312 | 1.00 | — | — | |
| SCHEMBL1768149 | 0.74 | — | — | |
| SCHEMBL165360 | 0.74 | — | — | |
| SCHEMBL2924601 | 0.74 | — | — | |
| SCHEMBL2709128 | 0.74 | ALDH1A1 (0.36) | — | |
| SCHEMBL22589614 | 0.74 | ALDH1A1 (0.36) | — | |
| SCHEMBL986125 | 0.74 | — | — | |
| SCHEMBL8613099 | 0.74 | — | — | |
| SCHEMBL22589391 | 0.74 | — | — | |
| SCHEMBL318716 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2331 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4246647-B1 | ELECTROLYTE, SECONDARY BATTERY, AND ELECTRIC DEVICE | CONTEMPORARY AMPEREX TECHNOLOGY HONG KONG LTD (HK) | 2026-05-27 | — | — | EP | claimed |
| CN-122074092-A | Method for forming a boron nitride-containing film | 乔治洛德方法研究和开发液化空气有限公司 | 2026-05-22 | — | — | CN | claimed |
| US-20260139200-A1 | COMPOSITIONS AND METHODS FOR VAPOR PHASE SURFACE MODIFICATION | FUJIFILM ELECTRONIC MAT U S A INC (US) | 2026-05-21 | — | — | US | claimed |
| CN-121282350-B | Quick-charging lithium ion battery electrolyte and preparation method thereof | 江西智科新能源科技有限公司 | 2026-05-15 | — | — | CN | claimed |
| US-20260136856-A1 | METHOD AND SYSTEM FOR FORMING SILICON NITRIDE ON A SIDEWALL OF A FEATURE | ASM IP HOLDING BV (NL) | 2026-05-14 | — | — | US | claimed |
| CN-122029304-A | Method for forming silicon-containing film | 乔治洛德方法研究和开发液化空气有限公司 | 2026-05-12 | — | — | CN | claimed |
| US-20260094868-A1 | Electrolyte and Lithium Ion Battery | HEFEI GOTION HIGH-TECH POWER ENERGY CO., LTD. (CN) | 2026-04-02 | — | — | US | claimed |
| US-12550644-B2 | Method and system for forming silicon nitride on a sidewall of a feature | ASM IP HOLDING B.V. (NL) | 2026-02-10 | — | — | US | claimed |
| EP-4683751-A1 | PLASMA-POLYMER SURFACE COATING | LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST) (LU) | 2026-01-28 | — | — | EP | claimed |
| US-20260018671-A1 | SECONDARY BATTERY AND ELECTRONIC DEVICE | NINGDE AMPEREX TECHNOLOGY LIMITED (CN) | 2026-01-15 | — | — | US | claimed |
| EP-0919874-A2 | Photoresist composition effective for use as an ion etch barrier after patterning | TRW Inc. (US) | 1999-06-02 | — | — | EP | claimed |
| EP-0671483-B1 | Method for vapor deposition of a ceramic coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM SPA (IT) | 1997-12-29 | — | — | EP | claimed |
| US-5663398-A | Processes for preparing functionalized alkyllithium compounds | FMC CORPORATION (US) | 1997-09-02 | — | — | US | claimed |
| EP-0540084-B1 | Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons | ENICHEM SPA (IT) | 1996-09-04 | — | — | EP | claimed |
| EP-0671483-A1 | Ceramic vapor deposited coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM S.p.A. (IT) | 1995-09-13 | — | — | EP | claimed |
| US-5424095-A | Decomposing organosilicon precursor inside chemical reactor to form film of ceramic material on surface; prevents coking | ENIRICERCHE S.P.A. (IT) | 1995-06-13 | — | — | US | claimed |
| EP-0540084-A1 | Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons | ENICHEM S.p.A. (IT) | 1993-05-05 | — | — | EP | claimed |
| US-5208069-A | Silane precursor | ISTITUTO GUIDO DONEGANI S.P.A. (IT) | 1993-05-04 | — | — | US | claimed |
| EP-0184567-B1 | PROCESS FOR THE FORMATION OF NEGATIVE PATTERNS IN A PHOTORESIST LAYER | UCB Electronics, S.A. (BE) | 1989-12-13 | — | — | EP | claimed |
| US-4412073-A | Isocyanurate preparation by catalytic, aminosilyl initiated cyclotrimerization of isocyanates | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1983-10-25 | — | — | US | claimed |