⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27970858 | 0.96 | — | — | |
| SCHEMBL28002108 | 0.96 | — | — | |
| SCHEMBL28002085 | 0.93 | — | — | |
| Sulfuric Acid SCHEMBL8323976 | 0.83 | CA5A (0.32) | — | |
| SCHEMBL234175 | 0.74 | — | — | |
| SCHEMBL7266312 | 0.74 | — | — | |
| SCHEMBL27034798 | 0.70 | — | — | |
| SCHEMBL27688918 | 0.67 | — | — | |
| SCHEMBL18811272 | 0.64 | — | — | |
| SCHEMBL165360 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5756256-A | Silylated photo-resist layer and planarizing method | SHARP MICROELECTRONICS TECHNOLOGY, INC. (US) | 1998-05-26 | — | — | US | disclosed |
| US-5486424-A | Silylated photoresist layer and planarizing method | SHARP KABUSHIKI KAISHA (JP) | 1996-01-23 | — | — | US | disclosed |
| WO-1994017803-A9 | ADENOSINE KINASE INHIBITORS | — | 1994-09-29 | — | — | WO | disclosed |
| US-4882008-A | Dry development of photoresist | TEXAS INSTRUMENTS INCORPORATED (US) | 1989-11-21 | — | — | US | disclosed |