Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 7/20 | 0.54 |
| ▸ | CA2 | P00918 | 7/20 | 0.54 |
| ▸ | CA12 | O43570 | 6/20 | 0.54 |
| ▸ | CA9 | Q16790 | 6/20 | 0.54 |
| ▸ | CA14 | Q9ULX7 | 5/20 | 0.54 |
| ▸ | EGFR | P00533 | 1/20 | 0.52 |
| ▸ | STS | P08842 | 1/20 | 0.47 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.47 |
| ▸ | ERN1 | O75460 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | CA7 | P43166 | 1/20 | 0.44 |
| ▸ | PLAU | P00749 | 2/20 | 0.44 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.43 |
| ▸ | PTPRC | P08575 | 1/20 | 0.43 |
| ▸ | PTPRF | P10586 | 1/20 | 0.43 |
| ▸ | CDC25B | P30305 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23432774 | 0.94 | EGFR (0.62) | CA1CA2CA12CA9CA14 | |
| SCHEMBL21794097 | 0.84 | CA12 (0.57) | CA1CA2CA12CA9CA14 | |
| SCHEMBL16749646 | 0.80 | EGFR (0.62) | CA1CA2CA12CA9CA14 | |
| SCHEMBL24581543 | 0.79 | CA12 (0.52) | CA1CA2CA12CA9CA14 | |
| SCHEMBL16749645 | 0.79 | CA1 (0.61) | CA1CA2CA12CA9CA14 | |
| SCHEMBL10009170 | 0.79 | CA1 (0.61) | CA1CA2CA12CA9CA14 | |
| SCHEMBL21794146 | 0.79 | SMN1; SMN2 (0.50) | CA1CA2CA9PTGS2ERN1 | |
| SCHEMBL21182648 | 0.79 | EGFR (0.56) | CA1CA2CA12CA9CA14 | |
| SCHEMBL361378 | 0.78 | PTGS2 (0.53) | CA1CA2CA12CA9CA14 | |
| SCHEMBL23432950 | 0.78 | SMN1; SMN2 (0.53) | STSPTPN1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023162837-A1 | POSITIVE ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND COMPOUND | 富士フイルム株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162838-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023008347-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2023-02-02 | — | — | WO | disclosed |
| US-20210165325-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2021-06-03 | — | — | US | disclosed |