Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.67 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.67 |
| ▸ | AKR1C3 | P42330 | 3/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.52 |
| ▸ | HPGD | P15428 | 2/20 | 0.52 |
| ▸ | CA2 | P00918 | 2/20 | 0.50 |
| ▸ | CA4 | P22748 | 2/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
| ▸ | CA1 | P00915 | 1/20 | 0.50 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.50 |
| ▸ | CA6 | P23280 | 1/20 | 0.50 |
| ▸ | CA7 | P43166 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | CA9 | Q16790 | 1/20 | 0.50 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | CDC25B | P30305 | 3/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phthalic Acid SCHEMBL8720508 | 0.98 | ALDH1A1 (0.70) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Phthalic Acid SCHEMBL8474758 | 0.95 | ALDH1A1 (0.67) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Phthalic Acid SCHEMBL2326170 | 0.95 | ALDH1A1 (0.67) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Phthalic Acid SCHEMBL28286355 | 0.95 | ALDH1A1 (0.67) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Phthalic Acid SCHEMBL6765309 | 0.93 | ALDH1A1 (0.64) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Phthalic Acid SCHEMBL588315 | 0.93 | ALDH1A1 (0.70) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Phthalic Acid SCHEMBL3914685 | 0.93 | ALDH1A1 (0.70) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Phthalic Acid SCHEMBL192153 | 0.93 | ALDH1A1 (0.70) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Phthalic Acid SCHEMBL1930940 | 0.93 | ALDH1A1 (0.70) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Phthalic Acid SCHEMBL7030041 | 0.93 | ALDH1A1 (0.70) | ALDH1A1ALOX15AKR1C3KDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109942721-B | Aqueous solution of hydroxymethyl urea modified cationic polysaccharide | 淮海工学院 | 2021-04-02 | — | — | CN | claimed |
| US-8865013-B2 | Method for chemical mechanical polishing tungsten | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2014-10-21 | — | — | US | claimed |
| US-20130045598-A1 | Method for chemical mechanical polishing tungsten | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2013-02-21 | — | — | US | claimed |
| US-7291280-B2 | Multi-step methods for chemical mechanical polishing silicon dioxide and silicon nitride | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2007-11-06 | — | — | US | claimed |
| US-20060138086-A1 | Planarizing the silica with an aqueous mixture of a carboxy polymer, abrasive, polyvinylpyrrolidone, and optionally a cationic compound, phthalic acid or salts, and a zwitterionic compound; followed by cleaning with a aqueous quaternary ammonium compound, phthalic acid, carboxy polymer and abrasive | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2006-06-29 | — | — | US | claimed |
| EP-1535979-A2 | Compositions and methods for chemical mechanical polishing silica and silicon nitride | Rohm and Haas Electronic Materials CMP Holdings, Inc. (US) | 2005-06-01 | — | — | EP | claimed |
| US-20050108947-A1 | Compositions and methods for chemical mechanical polishing silica and silicon nitride | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2005-05-26 | — | — | US | claimed |
| US-6828084-B2 | Including phthalic acid or salt in both acidic stop and ferric ligand with rehalogenating agent solutions; treating silver halide material | EASTMAN KODAK COMPANY | 2004-12-07 | — | — | US | claimed |
| US-20040142835-A1 | Washing liquid for semiconductor substrate | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-07-22 | — | — | US | claimed |
| US-20040086810-A1 | Odorless photographic bleaching composition and color photographic processing | HAYE SHIRLEYANNE E (US) | 2004-05-06 | — | — | US | claimed |
| EP-0985059-B1 | COMPOSITION AND METHOD FOR POLISHING A COMPOSITE COMPRISING TITANIUM | RODEL INC (US) | 2002-11-06 | — | — | EP | claimed |
| EP-0985059-A4 | COMPOSITION AND METHOD FOR POLISHING A COMPOSITE COMPRISING TITANIUM | RODEL INC (US) | 2001-05-16 | — | — | EP | claimed |
| EP-0985059-A1 | COMPOSITION AND METHOD FOR POLISHING A COMPOSITE COMPRISING TITANIUM | Rodel, Inc. (US) | 2000-03-15 | — | — | EP | claimed |
| US-6017463-A | FORMING A SLURRY INCLUDING ABRASIVE PARTICLES HAVING A SOLUBILITY COATING, IN AN AQUEOUS CONCENTRATE HAVING SPECIFIC PARTICLE SIZE, BLENDED WITH SUSPENSION AGENT, MIXED WITH DEIZONIZED WATER; MIXING WITH OXIDZER; SUPPLYING TO THE PAD | ADVANCED MICRO DEVICES, INC. (US) | 2000-01-25 | — | — | US | claimed |
| EP-0970156-A1 | CHEMICAL-MECHANICAL POLISHING SLURRY FORMULATION AND METHOD FOR TUNGSTEN AND TITANIUM THIN FILMS | ADVANCED MICRO DEVICES, INC. (US) | 2000-01-12 | — | — | EP | claimed |
| US-5916855-A | ABRASIVE PARTICLES HAVING SOLUBILITY COATING COMPRISING PHTHALATE-CONTAINING COMPOUND, FERRIC SALT OXIDIZER, SUSPENSION AGENT, TITANIUM OXIDIER | ADVANCED MICRO DEVICES, INC. (US) | 1999-06-29 | — | — | US | claimed |
| WO-1998042790-A1 | CHEMICAL-MECHANICAL POLISHING SLURRY FORMULATION AND METHOD FOR TUNGSTEN AND TITANIUM THIN FILMS | ADVANCED MICRO DEVICES, INC. (US) | 1998-10-01 | — | — | WO | claimed |
| WO-1998042791-A1 | CHEMICAL-MECHANICAL POLISHING SLURRY FORMULATION AND METHOD FOR TUNGSTEN AND TITANIUM THIN FILMS | ADVANCED MICRO DEVICES, INC. (US) | 1998-10-01 | — | — | WO | claimed |
| WO-1998041671-A1 | COMPOSITION AND METHOD FOR POLISHING A COMPOSITE COMPRISING TITANIUM | RODEL, INC. (US) | 1998-09-24 | — | — | WO | claimed |
| US-5756398-A | Composition and method for polishing a composite comprising titanium | RODEL, INC. (US) | 1998-05-26 | — | — | US | claimed |