SCHEMBL23451908

SCHEMBL23451908

N[C](N)N.[GeH4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL219766 0.89
SCHEMBL4140551 0.60
SCHEMBL866054 0.60
SCHEMBL8944061 0.55
Thiourea SCHEMBL1008 0.55
Urea SCHEMBL9140114 0.55 LMNA (1.00)
Urea SCHEMBL8434002 0.55 LMNA (1.00)
SCHEMBL20117337 0.55
Hydrochloric Acid SCHEMBL14782379 0.55
Urea SCHEMBL20641124 0.55 LMNA (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12051586-B2 Method of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-07-30 US disclosed
US-20210175073-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-06-10 US disclosed