SCHEMBL8944061

SCHEMBL8944061

NC(N)=[Te]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL767925 0.77
SCHEMBL20394558 0.72
SCHEMBL4579723 0.72
SCHEMBL219766 0.61
SCHEMBL23451908 0.55
SCHEMBL4140551 0.55
SCHEMBL866054 0.55
Urea SCHEMBL8434002 0.50 LMNA (1.00)
Urea C 13 SCHEMBL12476878 0.50
Hydrochloric Acid SCHEMBL16761049 0.50 LMNA (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112236254-B Subminiature nanostructure prepared from amorphous nanostructure and preparation method thereof 韩国科学技术研究院 2023-04-18 CN claimed
US-11478852-B2 Micro-nanostructure manufactured using amorphous nanostructure and manufacturing method therefor KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2022-10-25 US claimed
US-5547830-A EXPOSURE TO LASER BEAMS FUJI PHOTO FILM CO., LTD. (JP) 1996-08-20 US claimed
US-11801501-B2 Composite body having nanoparticles uniformly dispersed in nano-sized pores in support, and method for producing same KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2023-10-31 US disclosed
CN-112236254-B Subminiature nanostructure prepared from amorphous nanostructure and preparation method thereof 韩国科学技术研究院 2023-04-18 CN disclosed
US-11478852-B2 Micro-nanostructure manufactured using amorphous nanostructure and manufacturing method therefor KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2022-10-25 US disclosed
CN-111051390-B Amorphous nanostructure composed of inorganic polymer and method for producing same 韩国科学技术研究院 2022-03-22 CN disclosed
US-5547830-A EXPOSURE TO LASER BEAMS FUJI PHOTO FILM CO., LTD. (JP) 1996-08-20 US disclosed
US-4891069-A CATALYST FOR REDUCTION OF METAL COMPOUND BY GENERATED HYDROGEN TECHNO INSTRUMENTS INVESTMENTS 1983 LTD. (IL) 1990-01-02 US disclosed
US-4882202-A Use of immersion tin and tin alloys as a bonding medium for multilayer circuits TECHNO INSTRUMENTS INVESTMENTS 1983 LTD. (IL) 1989-11-21 US disclosed
US-4816070-A PRINTED CIRCUITS, ADHESION TECHO INSTRUMENTS INVESTMENTS LTD. (IL) 1989-03-28 US disclosed
US-4790912-A ELECTROLYTICALLY-GENERATED HYDROGEN AND CATALYST CONVERT METAL SALT IN BATH TO METAL TECHNO-INSTRUMENTS INVESTMENTS LTD. (IL) 1988-12-13 US disclosed
US-4749449-A PLATING ON CATALYZED THROUGH HOLE WALL IN PATTERENED CONDUCTIVE AND INSULATING LAYERS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1988-06-07 US disclosed
US-4715894-A AMINIMIZATION OF SMEAR TECHNO INSTRUMENTS INVESTMENTS 1983 LTD. (IL) 1987-12-29 US disclosed
US-4657632-A CONTAINING A THIOUREA AND A UREA COMPOUND TECHNO INSTRUMENTS INVESTMENTS 1983 LTD. (IL) 1987-04-14 US disclosed
EP-0216531-A1 Use of immersion tin and tin alloys as a bonding medium for multilayer circuits TECHNO INSTRUMENTS INVESTMENTS 1983 LTD. (IL) 1987-04-01 EP disclosed