SCHEMBL23489686

SCHEMBL23489686

C=CCOCC(=C)C(=O)OCC(=O)OCC(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23489697 0.92 TDP1 (0.33) TDP1
SCHEMBL23489560 0.86 TDP1 (0.34) TDP1
SCHEMBL23489443 0.80 MEN1 (0.36) TDP1
SCHEMBL23474729 0.78 TDP1 (0.33) TDP1
SCHEMBL23489685 0.76
SCHEMBL2611522 0.76 TSHR (0.37)
SCHEMBL23489446 0.76 TDP1 (0.33) TDP1
SCHEMBL23489441 0.74 TDP1 (0.30) TDP1
SCHEMBL10226361 0.74 ALDH1A1 (0.41)
SCHEMBL352550 0.73 TDP1 (0.40) TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021111913-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND JSR株式会社 2021-06-10 WO disclosed