Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 3/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.30 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28890647 | 0.91 | NAAA (0.39) | NAAACYP1A2EPHX1 | |
| SCHEMBL28417541 | 0.89 | NAAA (0.37) | NAAACYP1A2 | |
| SCHEMBL29217395 | 0.82 | NAAA (0.33) | NAAACYP1A2EPHX1 | |
| SCHEMBL28417471 | 0.80 | CYP1A2 (0.33) | NAAACYP1A2 | |
| SCHEMBL11205257 | 0.78 | EPHX1 (0.34) | NAAAEPHX1 | |
| SCHEMBL9723842 | 0.76 | SIGMAR1 (0.41) | SIGMAR1 | |
| Water SCHEMBL28105373 | 0.76 | EPHX1 (0.33) | NAAAEPHX1 | |
| SCHEMBL20720478 | 0.76 | EPHX1 (0.31) | EPHX1 | |
| SCHEMBL3886152 | 0.75 | NAAA (0.36) | NAAACYP1A2EPHX1 | |
| SCHEMBL677762 | 0.74 | NAAA (0.47) | NAAACYP1A2ALDH1A1TDP1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12248251-B2 | Silicon-containing resist underlayer film-forming composition including organic group having ammonium group | NISSAN CHEMICAL CORPORATION (JP) | 2025-03-11 | — | — | US | disclosed |
| US-11966164-B2 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| US-20220373888-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ORGANIC GROUP HAVING AMMONIUM GROUP | NISSAN CHEMICAL CORPORATION (JP) | 2022-11-24 | — | — | US | disclosed |
| US-20210181635-A1 | SEMICONDUCTOR DEVICE PRODUCTION METHOD EMPLOYING SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ORGANIC GROUP HAVING AMMONIUM GROUP | NISSAN CHEMICAL CORPORATION (JP) | 2021-06-17 | — | — | US | disclosed |