SCHEMBL235177

SCHEMBL235177

C=CC(F)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7193139 0.82
Bicarbonate SCHEMBL10325879 0.82 LMNA (0.39)
SCHEMBL1077308 0.77
SCHEMBL1080688 0.76
SCHEMBL459543 0.76
SCHEMBL116832 0.74
SCHEMBL18570916 0.73
SCHEMBL11819527 0.71
SCHEMBL11819511 0.71
SCHEMBL8589671 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 468 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024143465-A1 TUBE FOR SEMICONDUCTOR MANUFACTURING APPARATUS AGC株式会社 2024-07-04 WO claimed
WO-2024143464-A1 TUBE FOR SEMICONDUCTOR MANUFACTURING DEVICE AGC株式会社 2024-07-04 WO claimed
WO-2024143463-A1 TUBE FOR SEMICONDUCTOR MANUFACTURING DEVICE AGC株式会社 2024-07-04 WO claimed
WO-2024019010-A1 MODIFIED POLYTETRAFLUOROETHYLENE, MOLDED ARTICLE, AND STRETCHED POROUS BODY PRODUCTION METHOD AGC株式会社 2024-01-25 WO claimed
WO-2023142949-A1 ANTI-DRIPPING AGENT, PREPARATION METHOD THEREFOR AND USE THEREOF 熵能创新材料(珠海)有限公司 2023-08-03 WO claimed
US-11642877-B2 Glass resin laminate, composite laminate, and manufacturing method thereof AGC Inc. (JP) 2023-05-09 US claimed
WO-2023004585-A1 FLUOROELASTOMER COMPOSITION SOLVAY SPECIALTY POLYMERS ITALY S.P.A. (IT) 2023-02-02 WO claimed
CN-111742005-B Fluoroelastomer curable compositions 索尔维特殊聚合物意大利有限公司 2023-01-20 CN claimed
WO-2022265048-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING COPOLYMER AGC株式会社 2022-12-22 WO claimed
US-11318641-B2 Laminated film and method for producing semiconductor element AGC Inc. (JP) 2022-05-03 US claimed
US-20080200627-A1 METHOD FOR PRODUCING MELT-PROCESSABLE FLUORORESIN ASAHI GLASS CO., LTD. (JP) 2008-08-21 US claimed
EP-1942118-A1 FLUORORESIN WITH LOW FLUORINE-CONTAINING EMULSIFIER RESIDUAL AND METHOD FOR PRODUCING SAME Asahi Glass Company, Limited (JP) 2008-07-09 EP claimed
EP-1939223-A1 METHOD FOR PRODUCING MELT-MOLDABLE FLUORORESIN Asahi Glass Company, Limited (JP) 2008-07-02 EP claimed
US-20070021551-A1 Fine fluoropolymer powders SOLVAY SOLEXIS S.P.A. 2007-01-25 US claimed
CN-1493554-A Poly fluoroalkylol with ethylene terminal and its derivative, preparation method and use 中国科学院上海有机化学研究所 2004-05-05 CN claimed
EP-0939088-B1 Low-melting tetrafluoroethylene copolymer DU PONT (US) 2003-05-02 EP claimed
US-6344493-B2 COMPRISING POLYTETRAFLUOROETHYLENE AND A POLYMER BASED ON AN ALKYL (METH)ACRYLATE OF 5-30 CARBON ATOMS; IMPROVES MELT PROCESSABILITY WITHOUT IMPAIRING SURFACE APPEARANCE MITSUBISHI RAYON CO., LTD. (JP) 2002-02-05 US claimed
EP-0977192-A1 OPTICAL RECORDING DEVICE AND OPTICAL RECORDING MEDIUM TORAY INDUSTRIES, INC. (JP) 2000-02-02 EP claimed
US-5216081-A Comprising a fluoroolefin, a beta-methyl alpha olefin, functionalized unsaturated compounds and unsaturated esters; paints; weatherproofing; solvent solubility; antisoilants DAIKIN INDUSTRIES, LTD. (JP) 1993-06-01 US claimed
US-5169915-A Solvent solubility, compatibility with curing agents DAIKIN INDUSTRIES, LTD. (JP) 1992-12-08 US claimed