Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 6/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.34 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.32 |
| ▸ | ITGB2 | P05107 | 1/20 | 0.32 |
| ▸ | ICAM1 | P05362 | 1/20 | 0.32 |
| ▸ | ITGAL | P20701 | 1/20 | 0.32 |
| ▸ | BRD4 | O60885 | 1/20 | 0.30 |
| ▸ | CREBBP | Q92793 | 1/20 | 0.30 |
| ▸ | HTR2C | P28335 | 1/20 | 0.30 |
| ▸ | HTR2B | P41595 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23558664 | 0.77 | HSD11B1 (0.36) | HSD11B1BRD4CREBBPHTR2CHTR2B | |
| SCHEMBL31178066 | 0.71 | HSD11B1 (0.39) | HSD11B1ALOX12HTR2C | |
| SCHEMBL7098420 | 0.70 | HTR2C (0.45) | HSD11B1HTR2CHTR2B | |
| SCHEMBL23333433 | 0.69 | CHRM3 (0.36) | HSD11B1ALOX12 | |
| SCHEMBL18815082 | 0.68 | ALOX12 (0.30) | ALOX12 | |
| SCHEMBL18814832 | 0.68 | ALOX12 (0.30) | ALOX12 | |
| SCHEMBL13182547 | 0.67 | CYP3A4 (0.37) | HSD11B1ALOX12 | |
| SCHEMBL8321738 | 0.67 | TSHR (0.33) | — | |
| SCHEMBL18788896 | 0.67 | — | — | |
| SCHEMBL14021449 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11675267-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-13 | — | — | US | disclosed |
| US-11675267-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-13 | — | — | US | disclosed |
| US-20210191266-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-06-24 | — | — | US | disclosed |