Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24760010 | 1.00 | POLB (0.31) | POLBKMT2AMEN1 | |
| SCHEMBL15745524 | 1.00 | POLB (0.31) | POLBKMT2AMEN1 | |
| SCHEMBL10172833 | 0.93 | POLB (0.31) | POLBKMT2A | |
| SCHEMBL18775848 | 0.92 | KMT2A (0.33) | POLBKMT2AMEN1 | |
| SCHEMBL24861534 | 0.92 | KMT2A (0.33) | POLBKMT2AMEN1 | |
| SCHEMBL12149990 | 0.82 | ALDH1A1 (0.30) | POLB | |
| SCHEMBL18572476 | 0.81 | — | — | |
| SCHEMBL21731695 | 0.80 | KMT2A (0.30) | POLBKMT2A | |
| SCHEMBL17281287 | 0.80 | KMT2A (0.30) | POLBKMT2A | |
| SCHEMBL18634249 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11703756-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-20230041025-A1 | NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, PATTERN FORMATION METHOD, CURED FILM, CURED FILM PRODUCTION METHOD, AND ROLLED BODY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-02-09 | — | — | US | disclosed |
| US-11181822-B2 | — | — | 2021-11-23 | — | — | US | disclosed |
| US-20210200088-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-01 | — | — | US | disclosed |