SCHEMBL24760010

SCHEMBL24760010

O=C1OC2C3C[C@H](CC13)C2C(=O)OCCS(=O)(=O)O

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.31
KMT2A Q03164 2/20 0.31
MEN1 O00255 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23595461 1.00 POLB (0.31) POLBKMT2AMEN1
SCHEMBL15745524 1.00 POLB (0.31) POLBKMT2AMEN1
SCHEMBL10172833 0.93 POLB (0.31) POLBKMT2A
SCHEMBL18775848 0.92 KMT2A (0.33) POLBKMT2AMEN1
SCHEMBL24861534 0.92 KMT2A (0.33) POLBKMT2AMEN1
SCHEMBL12149990 0.82 ALDH1A1 (0.30) POLB
SCHEMBL18572476 0.81
SCHEMBL21731695 0.80 KMT2A (0.30) POLBKMT2A
SCHEMBL17281287 0.80 KMT2A (0.30) POLBKMT2A
SCHEMBL18634249 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022265002-A1 RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD 東京応化工業株式会社 2022-12-22 WO disclosed