Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 17/20 | 0.45 |
| ▸ | ADRB1 | P08588 | 17/20 | 0.45 |
| ▸ | ADRB3 | P13945 | 17/20 | 0.45 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10875780 | 0.93 | ADRB2 (0.50) | ADRB2ADRB1ADRB3TSHRALDH1A1 | |
| SCHEMBL23601570 | 0.89 | ADRB2 (0.41) | ADRB2ADRB1ADRB3 | |
| SCHEMBL19316655 | 0.88 | ADRB2 (0.47) | ADRB2ADRB1ADRB3TSHRALDH1A1 | |
| SCHEMBL9792359 | 0.87 | ADRB2 (0.59) | ADRB2ADRB1ADRB3TSHRALDH1A1 | |
| SCHEMBL13002778 | 0.87 | ADRB2 (0.59) | ADRB2ADRB1ADRB3TSHRALDH1A1 | |
| SCHEMBL10706533 | 0.87 | MAPT (0.54) | ADRB2ADRB1ADRB3TSHRALDH1A1 | |
| SCHEMBL9464962 | 0.86 | ALDH1A1 (0.52) | ADRB2ADRB1ADRB3ALDH1A1 | |
| SCHEMBL24845121 | 0.86 | ADRB2 (0.49) | ADRB2ADRB1ADRB3TSHRALDH1A1 | |
| SCHEMBL21422410 | 0.86 | ADRB2 (0.49) | ADRB2ADRB1ADRB3TSHR | |
| SCHEMBL12126370 | 0.85 | ADRB2 (0.58) | ADRB2ADRB1ADRB3TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024203153-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, AND POLYMER FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2024-10-03 | — | — | WO | disclosed |
| US-20210200093-A1 | COATING COMPOSITION FOR PHOTORESIST UNDERLAYER | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2021-07-01 | — | — | US | disclosed |