SCHEMBL23633202

SCHEMBL23633202

C=C(C)C(=O)OC(C)(C)N=C=O

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.38
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7130273 0.84 ALDH1A1 (0.38) ALDH1A1TSHR
SCHEMBL17006924 0.84 ALDH1A1 (0.38) ALDH1A1TSHR
SCHEMBL20183943 0.82 ALDH1A1 (0.37) ALDH1A1TSHR
Cyclohexane SCHEMBL8842743 0.79 ALDH1A1 (0.34) ALDH1A1
SCHEMBL10980241 0.79 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL10980242 0.79 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL1848842 0.78 THRB (0.37) ALDH1A1TSHR
SCHEMBL1527802 0.75 THRB (0.35) ALDH1A1TSHR
SCHEMBL5163549 0.75 ALDH1A1 (0.31) ALDH1A1TSHR
SCHEMBL29071600 0.74 ALDH1A1 (0.33) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116583498-A Blocked isocyanate compound 株式会社力森诺科 2023-08-11 CN disclosed
WO-2021141002-A1 (METH)ACRYLIC ACID ESTER COMPOUND HAVING ISOCYANATE GROUP, AND METHOD FOR PRODUCING SAME 昭和電工株式会社 2021-07-15 WO disclosed
CN-105916953-B Laminated body and polarizing film 日本瑞翁株式会社 2019-11-19 CN disclosed
CN-110167734-A MOLDED ARTICLE AND METHOD FOR PRODUCING SAME 住友化学株式会社 2019-08-23 CN disclosed
CN-108885920-A Resin composition 三菱化学株式会社 2018-11-23 CN disclosed
CN-105916953-A Laminate and polarizing plate 日本瑞翁株式会社 2016-08-31 CN disclosed
CN-101076523-B Oxetane compound containing (meth) acryloyl group and method for producing same SHOWA DENKO KK 2011-03-30 CN disclosed
CN-101076523-A Oxetane compound containing (meth) acryloyl group and method for producing same SHOWA DENKO KK (JP) 2007-11-21 CN disclosed