⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22877401 | 0.80 | ALDH1A1 (0.32) | — | |
| SCHEMBL22877664 | 0.80 | ALDH1A1 (0.32) | — | |
| SCHEMBL22877666 | 0.80 | ALDH1A1 (0.32) | — | |
| SCHEMBL17245057 | 0.67 | ALDH1A1 (0.33) | — | |
| SCHEMBL17245066 | 0.67 | ALDH1A1 (0.33) | — | |
| SCHEMBL15182582 | 0.67 | ALDH1A1 (0.33) | — | |
| SCHEMBL17245064 | 0.64 | ALDH1A1 (0.36) | — | |
| SCHEMBL15382568 | 0.61 | ALDH1A1 (0.42) | — | |
| SCHEMBL15946504 | 0.59 | ALDH1A1 (0.33) | — | |
| SCHEMBL22877663 | 0.59 | LMNA (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021140909-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2021-07-15 | — | — | WO | disclosed |