SCHEMBL2364462

SCHEMBL2364462

C=CCOC(=O)C(F)(F)S(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.40
TSHR P16473 2/20 0.36
ALDH1A1 P00352 2/20 0.36
HSD17B10 Q99714 1/20 0.36
PKM P14618 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MAPK1 P28482 3/20 0.34
RAB9A P51151 2/20 0.34
LMNA P02545 2/20 0.34
NPSR1 Q6W5P4 1/20 0.34
KMT2A Q03164 4/20 0.33
MEN1 O00255 3/20 0.33
HTT P42858 1/20 0.33
RHOA P61586 1/20 0.32
KDM4E B2RXH2 1/20 0.32
GAA P10253 1/20 0.32
MAPT P10636 1/20 0.32
CASP1 P29466 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547232 0.83 KMT2A (0.35) TSHRHSD17B10SMN1; SMN2MAPK1KMT2A
SCHEMBL1634221 0.82 KMT2A (0.34) TSHRALDH1A1HSD17B10SMN1; SMN2MAPK1
SCHEMBL1635918 0.81 TSHR (0.42) CYP3A4TSHRALDH1A1HSD17B10MAPK1
SCHEMBL547386 0.81 KMT2A (0.34) TSHRHSD17B10SMN1; SMN2KMT2AMEN1
SCHEMBL1634141 0.79 HTT (0.36) TSHRHSD17B10SMN1; SMN2KMT2AMEN1
SCHEMBL547285 0.79 TDP1 (0.35) TSHRHSD17B10SMN1; SMN2KMT2AMEN1
SCHEMBL245132 0.78 GAA (0.43) CYP3A4TSHRALDH1A1HSD17B10SMN1; SMN2
SCHEMBL1634200 0.78 TDP1 (0.37) TSHRKMT2AMEN1HTTCA1
SCHEMBL547269 0.78 TDP1 (0.37) TSHRALDH1A1LMNAKMT2AMEN1
SCHEMBL547029 0.78 TDP1 (0.37) TSHRKMT2AMEN1HTTCA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7993811-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-09 US disclosed
US-20090186298-A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-07-23 US disclosed