Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL546340 | 0.95 | TDP1 (0.36) | TDP1KMT2AHTTMEN1TSHR | |
| SCHEMBL547113 | 0.95 | TDP1 (0.36) | TDP1KMT2AHTTMEN1TSHR | |
| SCHEMBL547298 | 0.90 | TDP1 (0.33) | TDP1 | |
| SCHEMBL546476 | 0.90 | TDP1 (0.33) | TDP1 | |
| SCHEMBL546455 | 0.90 | TDP1 (0.30) | TDP1 | |
| SCHEMBL547031 | 0.90 | TDP1 (0.33) | TDP1 | |
| SCHEMBL547269 | 0.86 | TDP1 (0.37) | TDP1KMT2AHTTMEN1TSHR | |
| SCHEMBL1634200 | 0.86 | TDP1 (0.37) | TDP1KMT2AHTTMEN1TSHR | |
| SCHEMBL547029 | 0.86 | TDP1 (0.37) | TDP1KMT2AHTTMEN1TSHR | |
| SCHEMBL1634221 | 0.86 | KMT2A (0.34) | TDP1KMT2AHTTMEN1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524440-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-8110336-B2 | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20110165513-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LTD (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |