SCHEMBL2367987

SCHEMBL2367987

C=C(CC(=O)OCC(O)CC)C(=O)OCC(O)CC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.37
DUSP3 P51452 1/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
LMNA P02545 1/20 0.37
TSHR P16473 2/20 0.36
MGAM O43451 1/20 0.34
GAA P10253 1/20 0.34
SI P14410 1/20 0.34
MGAM2 Q2M2H8 1/20 0.34
ENPP2 Q13822 3/20 0.33
LPAR6 P43657 1/20 0.33
LPAR1 Q92633 1/20 0.33
LPAR4 Q99677 1/20 0.33
LPAR5 Q9H1C0 1/20 0.33
LPAR2 Q9HBW0 1/20 0.33
LPAR3 Q9UBY5 1/20 0.33
DGKA P23743 1/20 0.32
MAPT P10636 1/20 0.32
CYP3A4 P08684 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8459386 0.91 KDM4E (0.36) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL8459383 0.86 KDM4E (0.38) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL8462676 0.86 TSHR (0.36) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL8955207 0.86 KDM4E (0.37) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL27437108 0.84 TSHR (0.52) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL11076105 0.84 TSHR (0.35) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL2722973 0.84 KDM4E (0.45) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL28147024 0.83 TSHR (0.39) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL15946182 0.82 MGAM (0.50) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL10885622 0.82 TSHR (0.32) KDM4EDUSP3MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130261254-A1 REACTIVE DILUENTS, METHODS OF REACTING, AND THERMOSET POLYMERS DERIVED THEREFROM SEGETIS, INC. (US) 2013-10-03 US disclosed
WO-2013148933-A1 REACTIVE DILUENTS, METHODS OF REACTING, AND THERMOSET POLYMERS DERIVED THEREFROM SEGETIS, INC. (US) 2013-10-03 WO disclosed
US-8288496-B2 Contact lens and its manufacturing method NIPPON CONTACT LENS INC. (JP) 2012-10-16 US disclosed
US-20110237701-A1 CONTACT LENS AND ITS MANUFACTURING METHOD NIPPON CONTACT LENS INC. (JP) 2011-09-29 US disclosed
EP-2369370-A2 Contact lens and its manufacturing method Nippon Contact Lens Inc. (JP) 2011-09-28 EP disclosed
EP-0607900-B1 Resin composition for artificial marble, bulk molding compound and sheet molding compound using the same, and process for preparing artificial marble using the same HITACHI CHEMICAL CO LTD (JP) 1999-04-14 EP disclosed
US-5356953-A Resin composition for artificial marble, bulk molding compound and sheet molding compound using the same, and process for preparing artificial marble using the same HITACHI CHEMICAL COMPANY LIMITED (JP) 1994-10-18 US disclosed
EP-0607900-A2 Resin composition for artificial marble, bulk molding compound and sheet molding compound using the same, and process for preparing artificial marble using the same Hitachi Chemical Co., Ltd. (JP) 1994-07-27 EP disclosed
US-5009949-A Resin impregnated substrate HITACHI CHEMICAL COMPANY, LTD. (JP) 1991-04-23 US disclosed
EP-0293112-A2 Resin composition and electrical laminate obtained therefrom Hitachi Chemical Co., Ltd. (JP) 1988-11-30 EP disclosed