Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.48 |
| ▸ | TSHR | P16473 | 4/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | MMP9 | P14780 | 1/20 | 0.41 |
| ▸ | MMP8 | P22894 | 1/20 | 0.41 |
| ▸ | MMP14 | P50281 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2367465 | 0.96 | CYP3A4 (0.46) | CYP3A4TSHRALDH1A1MMP9MMP8 | |
| SCHEMBL31602148 | 0.91 | TSHR (0.46) | CYP3A4TSHRALDH1A1MMP9MMP8 | |
| SCHEMBL31602010 | 0.88 | CYP3A4 (0.55) | CYP3A4TSHRALDH1A1MMP9MMP8 | |
| SCHEMBL33532 | 0.88 | CYP3A4 (0.65) | CYP3A4TSHRALDH1A1MMP9MMP8 | |
| SCHEMBL6018588 | 0.88 | CYP3A4 (0.46) | CYP3A4TSHRALDH1A1MMP9MMP8 | |
| SCHEMBL31602081 | 0.87 | MEN1 (0.48) | CYP3A4TSHRALDH1A1MMP9MMP8 | |
| SCHEMBL629228 | 0.86 | ALDH1A1 (0.50) | CYP3A4TSHRALDH1A1MMP9MMP8 | |
| SCHEMBL31601976 | 0.86 | CYP3A4 (0.58) | CYP3A4TSHRALDH1A1MMP9MMP8 | |
| SCHEMBL31602026 | 0.86 | CYP3A4 (0.53) | CYP3A4TSHRALDH1A1MMP9MMP8 | |
| SCHEMBL20560196 | 0.86 | CYP3A4 (0.62) | CYP3A4TSHRALDH1A1MMP9MMP8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 216 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895639-B2 | Ink set, ink jet recording apparatus, and recorded article | SEIKO EPSON CORPORATION (JP) | 2014-11-25 | — | — | US | claimed |
| CN-120065654-A | Aqueous developer composition for flexographic printing plate and method for producing flexographic printing plate | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| EP-3061619-B1 | INK JET RECORDING METHOD | SEIKO EPSON CORP (JP) | 2023-11-15 | — | — | EP | disclosed |
| EP-3363644-B1 | RECORDING METHOD AND RECORDING APPARATUS | SEIKO EPSON CORP (JP) | 2023-05-03 | — | — | EP | disclosed |
| US-11472185-B2 | Liquid ejecting apparatus and maintenance method for liquid ejecting apparatus | SEIKO EPSON CORPORATION (JP) | 2022-10-18 | — | — | US | disclosed |
| US-11400722-B2 | Liquid ejecting apparatus and maintenance method for liquid ejecting apparatus | SEIKO EPSON CORPORATION (JP) | 2022-08-02 | — | — | US | disclosed |
| US-11400729-B2 | Ink jet recording method, ink set, and ink jet recording apparatus | SEIKO EPSON CORPORATION | 2022-08-02 | — | — | US | disclosed |
| EP-3216610-B1 | MAINTENANCE UNIT AND LIQUID JETTING DEVICE | SEIKO EPSON CORP (JP) | 2022-03-30 | — | — | EP | disclosed |
| US-11267247-B2 | Liquid ejecting apparatus and maintenance method for liquid ejecting apparatus | SEIKO EPSON CORPORATION (JP) | 2022-03-08 | — | — | US | disclosed |
| US-11135849-B2 | Liquid ejecting apparatus and maintenance method of liquid ejecting apparatus | SEIKO EPSON CORPORATION (JP) | 2021-10-05 | — | — | US | disclosed |
| CN-101305062-A | Oil-based ink composition for writing instrument and writing instrument using the same | MITSUBISHI PENCIL CO (JP) | 2008-11-12 | — | — | CN | disclosed |
| CN-101238556-A | Method and apparatus for producing porous silica | MITSUI CHEMICALS INC (JP) | 2008-08-06 | — | — | CN | disclosed |
| CN-100394559-C | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | SHINETSU CHEMICAL CO (JP) | 2008-06-11 | — | — | CN | disclosed |
| CN-100381526-C | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | SHINETSU CHEMICAL CO (JP) | 2008-04-16 | — | — | CN | disclosed |
| CN-1331745-C | Method for modifying porous film, modified porous film and its application | MITSUI CHEMICALS INC (JP) | 2007-08-15 | — | — | CN | disclosed |
| CN-1739190-A | Fluorine-free plasma curing method for porous Low-K material | AXCELIS TECH INC (US) | 2006-02-22 | — | — | CN | disclosed |
| CN-1681737-A | Method for modifying porous film, modified porous film and its application | MITSUI CHEMICALS INC (JP) | 2005-10-12 | — | — | CN | disclosed |
| CN-1649751-A | Ink housing tube for writing instrument | MITSUBISHI PENCIL CO (JP) | 2005-08-03 | — | — | CN | disclosed |
| CN-1519197-A | Zeolite sol and its prepn. method, compsn. for forming multiporous film, multiporous film and its prepn. method, interlayer insulation membrane and semiconductor device | ��Խ��ѧ��ҵ��ʽ���� | 2004-08-11 | — | — | CN | disclosed |
| CN-1501454-A | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | ��Խ��ѧ��ҵ��ʽ���� | 2004-06-02 | — | — | CN | disclosed |